SCHEMBL4388213

SCHEMBL4388213

COc1ccccc1NNC=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 5/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
LMNA P02545 1/20 0.46
ALDH1A1 P00352 6/20 0.46
MAPT P10636 3/20 0.46
NPC1 O15118 1/20 0.46
RAB9A P51151 1/20 0.46
HTT P42858 2/20 0.45
CHRM2 P08172 1/20 0.45
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA4 P22748 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
EGFR P00533 1/20 0.44
MMP1 P03956 1/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1639354 0.81 CA1 (0.60) GAASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL227125 0.80 TSHR (0.61) GAASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL30612357 0.80 TSHR (0.61) GAASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL7765963 0.77 RAB9A (0.68) SMN1; SMN2LMNAALDH1A1MAPTNPC1
SCHEMBL9264644 0.76 KMT2A (0.55) GAASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL24271124 0.75 CA1 (0.52) GAASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL11682921 0.75 MAPT (0.45) GAASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL9770278 0.74 MAPT (0.64) SMN1; SMN2LMNAALDH1A1MAPTNPC1
SCHEMBL11432694 0.74 CHRM2 (0.46) GAASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL18164130 0.74 ALDH1A1 (0.50) GAASMN1; SMN2ALDH1A1MAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1041433-B1 Heat-developable photosensitive material and method for forming image using the same FUJIFILM CORP (JP) 2009-11-25 EP disclosed
US-7488572-B2 Image formation method FUJIFILM CORPORATION (JP) 2009-02-10 US disclosed
US-7488572-B2 Image formation method FUJIFILM CORPORATION (JP) 2009-02-10 US disclosed
US-7429444-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-09-30 US disclosed
WO-2008076218-A1 PHOTOTHERMOGRAPHIC MATERIALS CONTAINING DEVELOPER AND CO-DEVELOPER CARESTREAM HEALTH, INC. (US) 2008-06-26 WO disclosed
US-20080145800-A1 PHOTOTHERMOGRAPHIC MATERIALS CONTAINING DEVELOPER AND CO-DEVELOPER CARESTREAM HEALTH, INC. 2008-06-19 US disclosed
US-20080145800-A1 PHOTOTHERMOGRAPHIC MATERIALS CONTAINING DEVELOPER AND CO-DEVELOPER CARESTREAM HEALTH, INC. 2008-06-19 US disclosed
US-20080145801-A1 PHOTOTHERMOGRAPHIC MATERIALS CONTAINING DEVELOPER AND CO-DEVELOPER CARESTREAM HEALTH, INC. 2008-06-19 US disclosed
US-20080145801-A1 PHOTOTHERMOGRAPHIC MATERIALS CONTAINING DEVELOPER AND CO-DEVELOPER CARESTREAM HEALTH, INC. 2008-06-19 US disclosed
US-7358038-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-04-15 US disclosed
US-6083680-A HIGH IN SENSITIVITY AND HIGH IN CONTRAST, AND CAN PROVIDE AN IMAGE LOW IN DMIN BY UV LIGHT, LIGHT-INSENSITIVE ORGANIC SILVER SALT, A LIGHT-SENSITIVE SILVER HALIDE, FUJI PHOTO FILM CO., LTD. (JP) 2000-07-04 US disclosed
US-6060228-A BACKING LAYER CONTAINS A METHINE DYE HAVING SPECIFIC MAXIMUM ABSORPTION WAVELENGTH FUJI PHOTO FILM CO., LTD. (JP) 2000-05-09 US disclosed
US-5922529-A MATERIAL HAVING PHOTOSENSITIVE LAYER CONTAINING MERCAPTAN COMPOUND AND MEROCYANINE DYE; IMPROVED SHARPNESS, SENSITIVITY, AGING STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1999-07-13 US disclosed
EP-0404192-B1 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor FUJI PHOTO FILM CO LTD (JP) 1995-08-23 EP disclosed
US-5041353-A Process for preparation of light-sensitive material containing silver halide, reducing agent, precursor and polymerizable compound FUJI PHOTO FILM CO., LTD. (JP) 1991-08-20 US disclosed
US-5039589-A Microencapsulation FUJI PHOTO FILM CO., LTD. (JP) 1991-08-13 US disclosed
EP-0404192-A2 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor FUJI PHOTO FILM CO., LTD. (JP) 1990-12-27 EP disclosed
US-4727084-A ANALGESICS ROUSSEL UCLAF (FR) 1988-02-23 US disclosed
US-4659729-A Novel 4H-1,2,4-triazole derivatives ROUSSEL UCLAF (FR) 1987-04-21 US disclosed
US-4512997-A 4,5-Bis(aryl)-4H-1,2,4-triazole derivatives and analgesic use ROUSSEL UCLAF (FR) 1985-04-23 US disclosed