SCHEMBL439261

SCHEMBL439261

C=C(C)C(=O)OCC(OC1CCCC1)OC1CCCC1

nearest known ligand 0.50

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.50
ALDH1A1 P00352 2/20 0.41
THRB P10828 1/20 0.36
EPHX1 P07099 2/20 0.33
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6987558 0.95 TSHR (0.46) TSHRALDH1A1THRBEPHX1
SCHEMBL31518846 0.85 TSHR (0.38) TSHRALDH1A1
SCHEMBL28514509 0.85 TSHR (0.49) TSHRALDH1A1THRBEPHX1HTT
SCHEMBL29086364 0.84 TSHR (0.56) TSHRALDH1A1THRBEPHX1HTT
SCHEMBL6987553 0.82 DHCR24 (0.33) TSHREPHX1HTT
SCHEMBL31613090 0.81 TSHR (0.45) TSHRALDH1A1THRBEPHX1HTT
SCHEMBL9127810 0.78 TSHR (0.61) TSHRALDH1A1THRB
SCHEMBL31053740 0.76 FKBP1A (0.39) TSHRALDH1A1THRB
SCHEMBL4073158 0.76 TSHR (0.46) TSHRALDH1A1HTT
SCHEMBL4871760 0.76 TSHR (0.58) TSHRALDH1A1THRBEPHX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110967927-B Photosensitive resin composition and display device including the same 三星显示有限公司 2025-01-28 CN claimed
CN-111123644-B Photosensitive resin composition, display, and method for forming pattern of display 株式会社东进世美肯 2024-09-03 CN claimed
CN-108572516-B Positive photosensitive resin composition, display device and pattern forming method thereof 株式会社东进世美肯 2023-10-17 CN claimed
US-10982061-B2 Photosensitive resin composition and display device including the same SAMSUNG DISPLAY CO., LTD. (KR) 2021-04-20 US claimed
CN-110967927-A Photosensitive resin composition and display device including the same 三星显示有限公司 2020-04-07 CN claimed
US-20200102433-A1 PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2020-04-02 US claimed
US-9389451-B2 Photosensitive resin composition, method of forming pattern, and liquid crystal display using the same SAMSUNG DISPLAY CO., LTD. (KR) 2016-07-12 US claimed
US-20140327866-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, AND LIQUID CRYSTAL DISPLAY USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-11-06 US claimed
EP-1941518-A1 METHOD FOR ELECTRICAL INSULATION VIA APPLYING A POLY (ARYLENE ETHER) COMPOSITION AND INSULATED ELECTRICAL CONDUCTOR General Electric Company (US) 2008-07-09 EP claimed
WO-2007037940-A1 METHOD FOR ELECTRICAL INSULATION VIA APPLYING A POLY (ARYLENE ETHER) COMPOSITION AND INSULATED ELECTRICAL CONDUCTOR GENERAL ELECTRIC COMPANY (US) 2007-04-05 WO claimed
US-20070066710-A1 Method for electrical insulation and insulated electrical conductor CITIBANK, N.A., AS COLLATERAL AGENT 2007-03-22 US claimed
US-20060275700-A1 Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same SAMSUNG ELECTRONICS CO., LTD. 2006-12-07 US claimed
US-6740358-B2 Reactive coalescents ROHM AND HAAS COMPANY 2004-05-25 US claimed
US-5530036-A STORAGE STABLE THERMOSETTING RESIN COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-25 US claimed
US-5399604-A Thermosetting resin composition comprising /A/ copolymer of unsaturated carboxylic acid or anhydride, unsaturated compound with epoxy group, unsaturated carboxylic acid ester or other vinyl compound, /B/ organic solvent, /C/ silane coupler JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-03-21 US claimed
CN-122055396-A Active energy ray-curable composition, optical article, or optical sheet DIC株式会社 2026-05-15 CN disclosed
US-12458966-B2 Microfluidic array, method of manufacture, measuring system comprising the microfluidic array, and use LEONHARD KURZ STIFTUNG & CO. KG (DE) 2025-11-04 US disclosed
US-5023136-A Dicyclopentyloxyalkyl acrylate; wear rsistance, strength, waterproofing HITACHI CHEMICAL COMPANY, LTD. (JP) 1991-06-11 US disclosed
EP-0330499-A2 Treatment of inorganic building materials Hitachi Chemical Co., Ltd. (JP) 1989-08-30 EP disclosed
US-4574138-A FREE RADICAL CATALYST, URETHANE ACRYLATE LOCTITE CORPORATION A CT CORP 1986-03-04 US disclosed