Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 4/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CRHBP | P24387 | 1/20 | 0.36 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | PRMT5 | O14744 | 2/20 | 0.35 |
| ▸ | WDR77 | Q9BQA1 | 2/20 | 0.35 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.35 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.35 |
| ▸ | RGS12 | O14924 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13879034 | 0.92 | TSHR (0.50) | TSHRKDM4EALDH1A1HTTNPSR1 | |
| SCHEMBL24519282 | 0.86 | TSHR (0.47) | TSHRKDM4EALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL22845686 | 0.84 | KDM4E (0.43) | KDM4EALDH1A1MAPTHTTLMNA | |
| SCHEMBL23369734 | 0.82 | ADRB2 (0.54) | TSHRKDM4EALDH1A1SMN1; SMN2ADRB2 | |
| SCHEMBL94906 | 0.80 | TSHR (0.68) | TSHRKDM4EALDH1A1MAPTHTT | |
| SCHEMBL24755313 | 0.79 | KDM4E (0.53) | TSHRKDM4EALDH1A1MAPTHTT | |
| SCHEMBL14982776 | 0.79 | ALDH1A1 (0.43) | TSHRALDH1A1HTTNPSR1 | |
| SCHEMBL36342 | 0.79 | ALDH1A1 (0.43) | TSHRALDH1A1HTTNPSR1 | |
| SCHEMBL28514509 | 0.78 | TSHR (0.49) | TSHRALDH1A1HTTADRB2ADRB1 | |
| SCHEMBL19998240 | 0.78 | TSHR (0.65) | TSHRKDM4EALDH1A1MAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117430812-B | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-03-19 | — | — | CN | claimed |
| CN-116577965-B | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116577965-A | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-116333303-B | Anti-mould-pressing alkaline aqueous development photosensitive adhesive film and application thereof | 明士(北京)新材料开发有限公司 | 2023-08-04 | — | — | CN | claimed |
| CN-116333303-A | Anti-mould-pressing alkaline aqueous development photosensitive adhesive film and application thereof | 明士(北京)新材料开发有限公司 | 2023-06-27 | — | — | CN | claimed |
| CN-115407610-B | Photosensitive resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-115437218-A | Photosensitive resin with symmetrical and asymmetrical structures and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-12-06 | — | — | CN | claimed |
| CN-115407610-A | Photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-29 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| CN-110028670-A | Low-dielectric loss negative light-sensitive poly amic acid ester resin, resin combination, preparation method and application | 明士新材料有限公司 | 2019-07-19 | — | — | CN | claimed |
| CN-110028669-A | Negative photosensitive poly amic acid ester resin, resin combination, preparation method and application | 明士新材料有限公司 | 2019-07-19 | — | — | CN | claimed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| EP-1775316-A1 | POLYAMIDE | Asahi Kasei EMD Corporation (JP) | 2007-04-18 | — | — | EP | disclosed |
| US-20050244739-A1 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1536286-A1 | HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | TSHR 3312/4885KDM4E 295/4885ALDH1A1 3316/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.