SCHEMBL439322

SCHEMBL439322

NNC(=O)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL668211 0.96
Propionamide SCHEMBL28111907 0.83 CTSD (0.39)
SCHEMBL301095 0.79
SCHEMBL2746569 0.74
SCHEMBL27952193 0.74 CYP1A2 (0.42)
SCHEMBL12002953 0.72 CYP1A2 (0.47)
Hydrochloric Acid SCHEMBL28279433 0.72 LMNA (0.53)
SCHEMBL20837325 0.72
SCHEMBL1001519 0.72
Hydrazinecarboxamide SCHEMBL30534508 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 708 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3786216-B1 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECH CORP (US) 2026-02-11 EP claimed
EP-4585665-A1 POLISHING AGENT, ADDITIVE SOLUTION FOR POLISHING AGENTS AND POLISHING METHOD AGC INC. (JP) 2025-07-16 EP claimed
US-20250197676-A1 POLISHING AGENT, ADDITIVE SOLUTION FOR POLISHING AGENT, AND POLISHING METHOD AGC Inc. (JP) 2025-06-19 US claimed
CN-119768483-A Polishing agent, additive liquid for polishing agent, and polishing method AGC株式会社 2025-04-04 CN claimed
EP-3137540-B1 STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION CYTEC IND INC (US) 2024-10-30 EP claimed
WO-2024053390-A1 POLISHING AGENT, ADDITIVE SOLUTION FOR POLISHING AGENTS AND POLISHING METHOD AGC株式会社 2024-03-14 WO claimed
EP-2691455-B1 CURABLE FLUOROELASTOMER COMPOSITION DUPONT SPECIALTY PRODUCTS USA LLC (US) 2024-03-13 EP claimed
US-11894429-B2 Amorphous metal oxide semiconductor layer and semiconductor device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2024-02-06 US claimed
EP-2864310-B1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE CYTEC TECH CORP (US) 2022-10-26 EP claimed
US-20220328635-A1 AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER AND SEMICONDUCTOR DEVICE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-10-13 US claimed
WO-1991009345-A1 SUPER-HIGH CONTRAST SILVER HALIDE MATERIAL INTERNATIONAL PAPER COMPANY (US) 1991-06-27 WO claimed
US-4816414-A CONTROLLED FORMATION AND GROWTH OF OPTICALLY VISIBLE CRYSTALS CRYSTAL DIAGNOSTICS, INC. (US) 1989-03-28 US claimed
EP-0140886-B1 FILM BADGE FOR DETERMINING CARBONYL COMPOUNDS Crystal Diagnostic Systems, Inc. (US) 1988-09-07 EP claimed
EP-0126326-B1 PROCESS FOR PREPARING 1,2,4-TRIAZOLE-3-CARBOXAMIDES UBE INDUSTRIES, LTD. (JP) 1987-08-05 EP claimed
US-4578479-A Process for preparing 1,2,4-triazole-3-carboxamides UBE INDUSTRIES, LTD. (JP) 1986-03-25 US claimed
EP-0140886-A4 FILM BADGE FOR DETERMINING CARBONYL COMPOUNDS. LITTLE INC A (US) 1985-09-02 EP claimed
EP-0140886-A1 FILM BADGE FOR DETERMINING CARBONYL COMPOUNDS. LITTLE INC A (US) 1985-05-15 EP claimed
EP-0126326-A1 Process for preparing 1,2,4-triazole-3-carboxamides UBE INDUSTRIES, LTD. (JP) 1984-11-28 EP claimed
WO-1984004165-A1 FILM BADGE FOR DETERMINING CARBONYL COMPOUNDS LITTLE INC A (US) 1984-10-25 WO claimed
US-4380587-A Film badge for determining carbonyl compounds ARTHUR D. LITTLE, INC. (US) 1983-04-19 US claimed