Hydrochloric Acid

Hydrochloric Acid

SCHEMBL439425

C1=CCC([Zr+2](C2=CC=CC2)=C(c2ccccc2)c2ccccc2)=C1.[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12624220-B2 Composition and cured product thereof DENKA COMPANY LIMITED (JP) 2026-05-12 US disclosed
EP-4723139-A2 COMPOSITION AND CURED BODY Denka Company Limited (JP) 2026-04-08 EP disclosed
EP-4183843-B1 COMPOSITION AND CURED BODY DENKA COMPANY LTD (JP) 2026-03-11 EP disclosed
EP-4502054-A1 COMPOSITION Denka Company Limited (JP) 2025-02-05 EP disclosed
WO-2024190873-A1 COMPOSITION AND CURED PRODUCT THEREOF デンカ株式会社 2024-09-19 WO disclosed
WO-2024190869-A1 CURABLE COMPOSITION AND CURED PRODUCT THEREOF デンカ株式会社 2024-09-19 WO disclosed
WO-2024190862-A1 CURABLE COMPOSITION AND CURED PRODUCT THEREOF デンカ株式会社 2024-09-19 WO disclosed
CN-118599041-A Composition and cured body 电化株式会社 2024-09-06 CN disclosed
CN-118599040-A Composition and cured body 电化株式会社 2024-09-06 CN disclosed
CN-115698200-B Composition and cured body 电化株式会社 2024-06-11 CN disclosed
EP-1028128-A1 CYCLOOLEFIN POLYMER REDUCED IN CATALYST RESIDUE CONTENT, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME TEIJIN LIMITED (JP) 2000-08-16 EP disclosed
EP-0964005-A1 Process for producing hydrogenated alpha-olefin-dicyclopentadiene copolymer, method for molding the same and optical material TEIJIN LIMITED (JP) 1999-12-15 EP disclosed
US-5817590-A METALLOCENE, IONIZING IONIC COMPOUND, ORGANOALUMINUM COMPOUND, LEWIS BASE TOSOH CORPORATION (JP) 1998-10-06 US disclosed
US-5698645-A POLYMERIZING AT LEAST ONE CYCLOOLEFIN AND ONE ACYCLIC OLEFIN IN THE PRESENCE OF A METALLOCENE CATALYST AND A COCATALYST HOECHST AKTIENGESELLSCHAFT (DE) 1997-12-16 US disclosed
EP-0612769-B1 Process for producing ethylene alpha-olefin copolymer TOSOH CORP (JP) 1997-11-12 EP disclosed
EP-0648786-B1 Process for producing alpha-olefin polymer TOSOH CORP (JP) 1997-07-16 EP disclosed
US-5576259-A POLYMERIZATION CATALYST INCLUDING METALLOCENE COMPOUND, IONIC COMPOUND, ORGANOALUMINUM COMPOUND, AND LEWIS BASE TOSOH CORPORATION (JP) 1996-11-19 US disclosed
EP-0653445-A1 Ethylene/alpha-olefin copolymer Tosoh Corporation (JP) 1995-05-17 EP disclosed
EP-0648786-A1 Process for producing alpha-olefin polymer Tosoh Corporation (JP) 1995-04-19 EP disclosed
EP-0612769-A1 Process for producing ethylene alpha-olefin copolymer TOSOH CORPORATION (JP) 1994-08-31 EP disclosed