⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL15018257 | 0.96 | TSHR (0.31) | — | |
| Water SCHEMBL28338535 | 0.96 | TSHR (0.31) | — | |
| Hydrochloric Acid SCHEMBL15018418 | 0.96 | TSHR (0.31) | — | |
| Hydrochloric Acid SCHEMBL29050718 | 0.96 | TSHR (0.31) | — | |
| SCHEMBL6577970 | 0.81 | — | — | |
| SCHEMBL8727735 | 0.80 | — | — | |
| SCHEMBL8531466 | 0.80 | — | — | |
| SCHEMBL16496647 | 0.78 | LMNA (0.32) | — | |
| SCHEMBL6578531 | 0.78 | — | — | |
| SCHEMBL16497423 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116003916-B | Ultra-soft polypropylene composition and preparation method and application thereof | 中国石油化工股份有限公司 | 2024-08-06 | — | — | CN | claimed |
| CN-117377716-A | Organosilicon pressure-sensitive adhesive and method for preparing same | 迈图高新材料公司 | 2024-01-09 | — | — | CN | claimed |
| CN-116003916-A | Ultra-soft polypropylene composition and preparation method and application thereof | 中国石油化工股份有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-114773027-A | Aerogel felt prepared at low cost and preparation method thereof | 巩义市泛锐熠辉复合材料有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114751718-A | Method for preparing hydrophobic silica aerogel felt under normal pressure | 巩义市泛锐熠辉复合材料有限公司 | 2022-07-15 | — | — | CN | claimed |
| CN-114616652-A | Monoalkoxysilanes and dense organosilica films prepared therefrom | 弗萨姆材料美国有限责任公司 | 2022-06-10 | — | — | CN | claimed |
| CN-108409894-B | Method for catalyzing vinyl monomer polymerization reaction by transition metal nanoparticles | 浙江工业大学 | 2020-12-25 | — | — | CN | claimed |
| US-10150822-B2 | Catalyst component for olefin polymerization, preparation method therefor and catalyst thereof | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2018-12-11 | — | — | US | claimed |
| CN-108409894-A | The method that transition metal nanoparticles are catalyzed polymerization of vinyl monomer reaction | 浙江工业大学 | 2018-08-17 | — | — | CN | claimed |
| CN-108314411-A | The method that silicon dioxide silica aerogel composite material is prepared without alcohol technique using no chlorine | 深圳中凝科技有限公司 | 2018-07-24 | — | — | CN | claimed |
| EP-2823083-A1 | METHODS FOR MAKING SILICON CONTAINING FILMS ON THIN FILM TRANSISTOR DEVICES | Air Products and Chemicals, Inc. (US) | 2015-01-14 | — | — | EP | claimed |
| US-20140163185-A1 | CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, PREPARATION METHOD THEREFOR AND CATALYST THEREOF | BEIJING RESEARCH INSTITUTE OF CHEMICAL INDUSTRY CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2014-06-12 | — | — | US | claimed |
| EP-1039521-B1 | Formation of improved low dielectric constant carbon-containing silicon oxide dielectric material by reaction of carbon-containing silane with oxidising agent in the presence of one or more reaction retardants | LSI LOGIC CORP (US) | 2014-04-23 | — | — | EP | claimed |
| WO-2013134653-A1 | METHODS FOR MAKING SILICON CONTAINING FILMS ON THIN FILM TRANSISTOR DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-09-12 | — | — | WO | claimed |
| CN-102898556-A | Application of catalyst component in olefin polymerization | CHINA PETROLEUM & CHEMICAL | 2013-01-30 | — | — | CN | claimed |
| CN-102898553-A | Catalyst component for olefin polymerization, and preparation method and catalyst thereof | CHINA PETROLEUM & CHEMICAL | 2013-01-30 | — | — | CN | claimed |
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | claimed |
| US-5654459-A | VIA COMPROPORTIONATION OF ALKYLCHLOROSILANES WITH HYDROGENCHLOROSILANES IN THE PRESENCE OF A ZIRCONIUM AND/OR ALUMINUM CATALYST SATURATED WITH A HYDROGEN HALIDE; HIGH YIELD AND PURITY | HUELS AKTIENGESELLSCHAFT (DE) | 1997-08-05 | — | — | US | claimed |