SCHEMBL439901

SCHEMBL439901

CCC1(COCC2(CC)COC2)COC1

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
EPHX1 P07099 1/20 0.35
POLB P06746 1/20 0.31
HSD17B10 Q99714 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26073685 0.97 TSHR (0.35) TSHREPHX1POLBHSD17B10MEN1
SCHEMBL6015433 0.93 TSHR (0.33) TSHREPHX1
Ethylene Glycol SCHEMBL464873 0.91 EPHX1 (0.39) TSHREPHX1POLBHSD17B10MEN1
SCHEMBL16123667 0.90 TSHR (0.31) TSHR
SCHEMBL1130527 0.90 TSHR (0.34) TSHREPHX1POLBHSD17B10MEN1
SCHEMBL12394593 0.90 TSHR (0.34) TSHREPHX1POLBHSD17B10MEN1
SCHEMBL213172 0.90 TSHR (0.34) TSHREPHX1POLBHSD17B10MEN1
SCHEMBL2734301 0.89 TSHR (0.32) TSHR
SCHEMBL12264016 0.89 EPHX1 (0.43) TSHREPHX1
SCHEMBL2830458 0.88 TSHR (0.33) TSHREPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4463 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260064002-A1 PHOTOSENSITIVE COMPOSITION AND FILM PREPARED FROM THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-03-05 US claimed
WO-2025108217-A1 EPOXY ADHESIVE INCLUDING POLYMERIC TOUGHENER, CATIONIC PHOTOINITIATOR, AND THERMAL CATIONIC INITIATOR AND METHOD FOR USING SAME 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-05-30 WO claimed
US-12297331-B2 Hard coating film LG CHEM, LTD. (KR) 2025-05-13 US claimed
CN-119823689-A Thermosetting conductive adhesive and preparation method and application thereof 拓迪化学(上海)股份有限公司 2025-04-15 CN claimed
CN-113454182-B Sealing agent for organic EL display element 积水化学工业株式会社 2025-01-17 CN claimed
CN-114868051-B Laminate body 住友化学株式会社 2024-12-31 CN claimed
CN-111527794-B Sealing agent for organic EL display element 积水化学工业株式会社 2024-07-05 CN claimed
CN-117820897-A Color conversion film ink and application thereof 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) 2024-04-05 CN claimed
CN-113166371-B Sealing agent for organic EL display element 积水化学工业株式会社 2024-03-29 CN claimed
CN-111480392-B Electronic device sealing agent and organic EL display element sealing agent 积水化学工业株式会社 2024-03-12 CN claimed
US-20070035604-A1 Cationic ink formulations MARKEM CORPORATION 2007-02-15 US claimed
US-20070035601-A1 Cationic ink formulations MARKEM CORPORATION 2007-02-15 US claimed
US-20050064333-A1 Thianthrenium salt cationic photoinitiators RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-03-24 US claimed
EP-1504306-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALTS AS CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-02-09 EP claimed
EP-1502155-A1 RADIATION CURABLE RESIN COMPOSITION AND RAPID PROTOTYPING PROCESS USING THE SAME DSM IP Assets B.V. (NL) 2005-02-02 EP claimed
US-20040142274-A1 Radiation curable resin composition and rapid prototyping process using the same STRATASYS INC. 2004-07-22 US claimed
WO-2003098347-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALT CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2003-11-27 WO claimed
US-20030218269-A1 Image-receiving layer composition and overcoat layer composition for ink-jet recording BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-11-27 US claimed
WO-2003093901-A1 RADIATION CURABLE RESIN COMPOSITION AND RAPID PROTOTYPING PROCESS USING THE SAME DSM IP ASSETS B.V. (NL) 2003-11-13 WO claimed
EP-1348727-A2 Image-receiving layer composition and overcoat layer composition for ink-jet recording BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-10-01 EP claimed