⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24339661 | 1.00 | — | — | |
| SCHEMBL10097032 | 0.79 | — | — | |
| SCHEMBL2569936 | 0.73 | — | — | |
| SCHEMBL6766012 | 0.72 | DPP4 (0.35) | — | |
| SCHEMBL987284 | 0.72 | PKM (0.41) | — | |
| SCHEMBL18882634 | 0.70 | — | — | |
| SCHEMBL1733050 | 0.69 | PKM (0.39) | — | |
| SCHEMBL15304345 | 0.69 | — | — | |
| SCHEMBL19568204 | 0.65 | — | — | |
| SCHEMBL10834878 | 0.65 | ALDH1A1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022048684-A1 | JNK INHIBITOR, PHARMACEUTICAL COMPOSITION THEREOF AND USE THEREOF | 武汉朗来科技发展有限公司 | 2022-03-10 | — | — | WO | disclosed |
| US-10544133-B2 | Heteroaryl substituted pyridyl compounds useful as kinase modulators | BRISTOL-MYERS SQUIBB COMPANY (US) | 2020-01-28 | — | — | US | disclosed |
| US-10023562-B2 | Heteroaryl substituted pyridyl compounds useful as kinase modulators | BRISTOL-MYERS SQUIBB COMPANY (US) | 2018-07-17 | — | — | US | disclosed |
| US-20170210730-A1 | HETEROARYL SUBSTITUTED PYRIDYL COMPOUNDS USEFUL AS KINASE MODULATORS | BRISTOL MYERS SQUIBB CO (US) | 2017-07-27 | — | — | US | disclosed |
| US-9657009-B2 | Heteroaryl substituted pyridyl compounds useful as kinase modulators | BRISTOL-MYERS SQUIBB COMPANY (US) | 2017-05-23 | — | — | US | disclosed |
| US-9546153-B2 | Bicyclic heterocycle substituted pyridyl compounds useful as kinase modulators | BRISTOL-MYERS SQUIBB COMPANY (US) | 2017-01-17 | — | — | US | disclosed |
| EP-2922840-B1 | BICYCLIC HETEROCYCLE SUBSTITUTED PYRIDYL COMPOUNDS USEFUL AS KINASE MODULATORS | BRISTOL MYERS SQUIBB CO (US) | 2016-12-21 | — | — | EP | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-7906269-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7906269-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| WO-2010140483-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD | セントラル硝子株式会社 (JP) | 2010-12-09 | — | — | WO | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| WO-2010044372-A1 | FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2010-04-22 | — | — | WO | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |