SCHEMBL4401739

SCHEMBL4401739

CCC(C)c1ccc(C)cc1O

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.64
TRPA1 O75762 2/20 0.64
CHRM1 P11229 2/20 0.64
ADRA1A P35348 2/20 0.64
SLC6A2 P23975 1/20 0.64
HTR2B P41595 1/20 0.64
TSHR P16473 1/20 0.59
SRC P12931 1/20 0.58
RORC P51449 1/20 0.49
ALDH1A1 P00352 4/20 0.42
GAA P10253 2/20 0.42
ALOX15 P16050 2/20 0.42
HSD17B10 Q99714 2/20 0.42
USP2 O75604 1/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42
MEN1 O00255 1/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30893081 1.00 LMNA (0.64) LMNATRPA1CHRM1ADRA1ASLC6A2
Potassium SCHEMBL29477939 0.98 LMNA (0.62) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL29477946 0.98 LMNA (0.62) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL6939529 0.86 RORC (0.59) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL30893093 0.85 SRC (0.64) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL26261042 0.84 LMNA (0.64) LMNATRPA1CHRM1ADRA1ASLC6A2
Potassium SCHEMBL29477971 0.83 SRC (0.62) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL29477991 0.83 SRC (0.62) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL28638697 0.82 SRC (0.60) LMNATRPA1CHRM1ADRA1ASLC6A2
SCHEMBL1104213 0.82 TSHR (0.61) TSHRRORCALDH1A1GAAALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10011676-B2 Compound containing phenolic hydroxyl group, phenolic resin, curable composition, cured product thereof, semiconductor sealing material, and printed circuit board DIC CORPORATION (JP) 2018-07-03 US disclosed
US-9902798-B2 Compound containing phenolic hydroxyl group, phenolic resin, curable composition, cured product thereof, semiconductor sealing material, and printed circuit board DIC CORPORATION (JP) 2018-02-27 US disclosed
EP-2701673-B1 DYE COMPOSITION USING A PARTICULAR PHENOLIC COUPLER IN A MEDIUM RICH IN FATTY SUBSTANCES, PROCESSES AND DEVICES L'ORÉAL (FR) 2017-09-13 EP disclosed
US-20170174600-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS TANSNA THERAPEUTICS, INC. 2017-06-22 US disclosed
US-20170174600-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS TANSNA THERAPEUTICS, INC. 2017-06-22 US disclosed
US-9630896-B2 2,5-dialkyl-4-H/halo/ether-phenol compounds TANSNA THERAPEUTICS, INC. (US) 2017-04-25 US disclosed
US-9630896-B2 2,5-dialkyl-4-H/halo/ether-phenol compounds TANSNA THERAPEUTICS, INC. (US) 2017-04-25 US disclosed
US-9630896-B2 2,5-dialkyl-4-H/halo/ether-phenol compounds TANSNA THERAPEUTICS, INC. (US) 2017-04-25 US disclosed
US-20150148430-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS TANSNA THERAPEUTICS, INC. 2015-05-28 US disclosed
US-20150148430-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS TANSNA THERAPEUTICS, INC. 2015-05-28 US disclosed
CN-103189408-B Water-based polyurethane resin composition, coating material using said composition, and coated article ADEKA CORP 2015-01-07 CN disclosed
CN-103189408-A Water-based polyurethane resin composition, coating material using said composition, and coated article ADEKA CORP 2013-07-03 CN disclosed
US-8232039-B2 Polymer and resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-07-31 US disclosed
US-8173352-B2 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-08 US disclosed
US-20100151380-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-17 US disclosed
US-20100136481-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 US disclosed
US-20100124719-A1 Polymer and Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-05-20 US disclosed
US-20100081085-A1 Polymer and Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-04-01 US disclosed
CN-1262586-C Polymer electrolyte composition and fuel cell SUMITOMO CHEMICAL CO (JP) 2006-07-05 CN disclosed
CN-1405217-A Polymer electrolyte composition and fuel cell SUMITOMO CHEMICAL CO (JP) 2003-03-26 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170174600-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS COMT, DDT, TYR LMNA 2070/4885TRPA1 1054/4885CHRM1 453/4885
US-10011676-B2 Compound containing phenolic hydroxyl group, phenolic resin, curable composition, cured product thereof, semiconductor sealing material, and printed circuit board ASH2L, SEM1, KDM1A LMNA 4048/4885TRPA1 214/4885CHRM1 582/4885
US-20150148430-A1 2,5-DIALKYL-4-H/HALO/ETHER-PHENOL COMPOUNDS COMT, DDT, TYR LMNA 2070/4885TRPA1 1054/4885CHRM1 453/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.