Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4403292 | 0.78 | MCL1 (0.32) | MCL1 | |
| SCHEMBL10068328 | 0.77 | MEN1 (0.31) | — | |
| SCHEMBL4405522 | 0.76 | ERN1 (0.35) | — | |
| SCHEMBL4402556 | 0.76 | ERN1 (0.37) | — | |
| SCHEMBL4443404 | 0.72 | — | — | |
| SCHEMBL4450996 | 0.72 | CYP2A6 (0.32) | — | |
| SCHEMBL4450983 | 0.71 | CYP2A6 (0.31) | — | |
| SCHEMBL4401557 | 0.69 | — | — | |
| SCHEMBL4402548 | 0.67 | — | — | |
| SCHEMBL4408083 | 0.66 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| EP-2447775-B1 | Resist underlayer film composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2447775-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-02 | — | — | EP | disclosed |