Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 10/20 | 0.42 |
| ▸ | MTNR1B | P49286 | 8/20 | 0.42 |
| ▸ | HTR2C | P28335 | 7/20 | 0.36 |
| ▸ | HTR2A | P28223 | 2/20 | 0.36 |
| ▸ | HTR2B | P41595 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 6/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4405582 | 0.92 | MTNR1A (0.39) | MTNR1AMTNR1BHTR2CHTR2AHTR2B | |
| SCHEMBL4402570 | 0.91 | HTR2A (0.40) | MTNR1AMTNR1BHTR2CHTR2AHTR2B | |
| SCHEMBL4408136 | 0.84 | HTR2A (0.38) | MTNR1AMTNR1BHTR2CHTR2AHTR2B | |
| SCHEMBL4745713 | 0.76 | CYP2A6 (0.33) | — | |
| SCHEMBL4401578 | 0.73 | HTR2A (0.36) | MTNR1AMTNR1BHTR2CHTR2AHTR2B | |
| SCHEMBL4402559 | 0.73 | MTNR1A (0.43) | MTNR1AMTNR1BHTR2CHTR2AHTR2B | |
| SCHEMBL4401575 | 0.71 | MTNR1A (0.37) | MTNR1AMTNR1BDPP4GAA | |
| SCHEMBL4402553 | 0.71 | MTNR1A (0.39) | MTNR1AMTNR1BHTR2CGAA | |
| SCHEMBL4405529 | 0.69 | MTNR1A (0.45) | MTNR1AMTNR1BHTR2CGAA | |
| SCHEMBL4438927 | 0.69 | CYP2A6 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |