SCHEMBL4401575

SCHEMBL4401575

COc1ccc2ccc3c(c2c1)CC1C2CC(C31)C1C3C=CC(C3)C21

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.37
DPP4 P27487 13/20 0.37
MTNR1B P49286 1/20 0.36
GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4405540 0.92 DPP4 (0.37) MTNR1ADPP4MTNR1BGAA
SCHEMBL4401569 0.81 CHRNB2 (0.42) GAA
SCHEMBL4402553 0.81 MTNR1A (0.39) MTNR1AMTNR1BGAA
SCHEMBL4401574 0.79 CHRNB2 (0.40) GAA
SCHEMBL4408096 0.77 DPP4 (0.39) MTNR1ADPP4MTNR1BGAA
SCHEMBL4402557 0.76 MEN1 (0.34) MTNR1AMTNR1BGAA
SCHEMBL4405533 0.75 HTR2A (0.42) MTNR1AMTNR1BGAA
SCHEMBL4405582 0.75 MTNR1A (0.39) MTNR1ADPP4MTNR1BGAA
SCHEMBL4402533 0.74 CYP19A1 (0.39)
SCHEMBL4405547 0.71 MTNR1A (0.42) MTNR1ADPP4MTNR1BGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed