SCHEMBL4407151

SCHEMBL4407151

O=P(O)(O)CCCCc1cc(Br)cc(Br)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR1 P21453 10/20 0.42
S1PR3 Q99500 10/20 0.42
S1PR2 O95136 9/20 0.42
S1PR4 O95977 6/20 0.42
GRIN2D O15399 1/20 0.41
GRIN3B O60391 1/20 0.41
GRIN1 Q05586 1/20 0.41
GRIN2A Q12879 1/20 0.41
GRIN2B Q13224 1/20 0.41
GRIN2C Q14957 1/20 0.41
GRIN3A Q8TCU5 1/20 0.41
TYMS P04818 1/20 0.41
LPAR2 Q9HBW0 4/20 0.39
S1PR5 Q9H228 1/20 0.39
LPAR3 Q9UBY5 3/20 0.38
ENPP2 Q13822 2/20 0.36
LMNA P02545 1/20 0.35
CYP3A4 P08684 1/20 0.35
NFKB1 P19838 1/20 0.35
BLM P54132 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4409076 0.94 GRIN2D (0.46) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL4417464 0.86 GRIN2D (0.43) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL4413668 0.81 S1PR1 (0.51) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL11435329 0.79 S1PR1 (0.54) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL4417341 0.77 GRIN2D (0.49) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL28224666 0.76 IDO1 (0.42) CYP3A4
SCHEMBL4415090 0.74 GRIN2D (0.50) S1PR1S1PR3S1PR2S1PR4GRIN2D
SCHEMBL4412387 0.73 PGK1 (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL4414066 0.72 S1PR2 (0.72) S1PR1S1PR3S1PR2S1PR4
SCHEMBL9026407 0.71 CA2 (0.40) CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250133947-A1 Thermal Evaporation-Growth of Halide Perovskites Through Phosphonic Acid Addition GEORGIA TECH RES INST (US) 2025-04-24 US disclosed
US-7635748-B2 Resin and article molded therefrom TORAY INDUSTRIES, INC. (JP) 2009-12-22 US disclosed
EP-1270646-B1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES (JP) 2008-11-26 EP disclosed
US-7442757-B2 Resin, resin composition, method for manufacturing the same, and molded material including the same TORAY INDUSTRIES, INC. (JP) 2008-10-28 US disclosed
US-20080139778-A1 Resin and article molded therefrom TAKANISHI KEIJIRO 2008-06-12 US disclosed
US-20060287464-A1 Resin and article molded therefrom TORAY INDUSTRIES, INC. (JP) 2006-12-21 US disclosed
EP-1640405-A1 RESIN AND ARTICLE MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2006-03-29 EP disclosed
US-20060047104-A1 Resin, resin composition, process for production thereof, and moldings made by using the same TORAY INDUSTRIES, INC. (JP) 2006-03-02 US disclosed
EP-1518884-A1 RESIN, RESIN COMPOSITIONS, PROCESS FOR PRODUCTION THEREOF, AND MOLDINGS MADE BY USING THE SAME TORAY INDUSTRIES, INC. (JP) 2005-03-30 EP disclosed
US-6750313-B2 HIGH REFRACTIVE INDEX AND LOW DISPERSION CHARACTERISTICS; OPTICAL LENSES, FILMS, DISCS; POLYCARBONATE RESIN CONTAINING A PHOSPHONIC ACID GROUP TORAY INDUSTRIES, INC. (JP) 2004-06-15 US disclosed
US-20030013836-A1 Resin composition and articles molded therefrom TORAY INDUSTRIES, INC., A CORPORATION OF JAPAN (JP) 2003-01-16 US disclosed
EP-1270646-A1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2003-01-02 EP disclosed