Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18857454 | 0.80 | TSHR (0.32) | CA2CA9 | |
| SCHEMBL10729404 | 0.77 | CA1 (0.32) | CA2CA9 | |
| SCHEMBL6692764 | 0.76 | ALDH1A1 (0.37) | CA2CA9 | |
| SCHEMBL20526044 | 0.75 | CA2 (0.37) | CA2CA9 | |
| SCHEMBL6406663 | 0.74 | CA2 (0.37) | CA2CA9 | |
| SCHEMBL8918640 | 0.74 | TSHR (0.34) | — | |
| SCHEMBL5341332 | 0.73 | CA2 (0.32) | CA2CA9 | |
| Methylethylamine SCHEMBL28981569 | 0.72 | CA2 (0.30) | CA2CA9 | |
| SCHEMBL29656 | 0.72 | CA2 (0.39) | CA2CA9 | |
| SCHEMBL8994524 | 0.71 | TSHR (0.38) | CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2212397-B1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING OF METAL AND POLISHING METHOD USING THE SAME | CHEIL IND INC (KR) | 2019-10-30 | — | — | EP | disclosed |
| US-9695347-B2 | Slurry composition for chemical mechanical polishing of metal and polishing method using the same | SAMSUNG SDI CO., LTD. (KR) | 2017-07-04 | — | — | US | disclosed |
| US-20090095939-A1 | Slurry Composition for Chemical Mechanical Polishing of Metal and Polishing Method Using the Same | CHEIL INDUSTRIES INC. (KR) | 2009-04-16 | — | — | US | disclosed |