SCHEMBL4408091

SCHEMBL4408091

COc1cccc2ccc3c(c12)C=CC3

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.38
RXRA P19793 1/20 0.38
PPARD Q03181 1/20 0.38
PPARA Q07869 1/20 0.38
MCHR1 Q99705 1/20 0.36
KDM4E B2RXH2 4/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
LMNA P02545 1/20 0.35
ATM Q13315 1/20 0.35
MTNR1A P48039 2/20 0.35
MTNR1B P49286 2/20 0.35
ALDH1A1 P00352 3/20 0.35
HPGD P15428 2/20 0.35
CYP2A6 P11509 1/20 0.35
GAA P10253 2/20 0.35
MAPT P10636 2/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
DCPS Q96C86 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27595227 0.81 MTNR1A (0.40) MTNR1AMTNR1BMAPT
SCHEMBL30584471 0.79 CA12 (0.41) KDM4ELMNAALDH1A1HPGDMAPT
SCHEMBL7333093 0.79 CA12 (0.41) KDM4ELMNAALDH1A1HPGDMAPT
SCHEMBL4403311 0.79 PPARG (0.39) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL4405532 0.74 PPARG (0.38) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL4623032 0.73 HSD17B10 (0.39) KDM4EATMALDH1A1HPGDCYP2A6
SCHEMBL29709902 0.72 CA12 (0.55) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL443530 0.72 CA12 (0.55) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL4445413 0.71 CYP2A6 (0.34) KDM4EMEN1KMT2ALMNAALDH1A1
SCHEMBL10345542 0.70 KDM4E (0.45) KDM4ELMNAALDH1A1HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed