SCHEMBL4410041

SCHEMBL4410041

CC(=N)NC(=O)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23425426 0.79 CRBN (0.36)
SCHEMBL1160845 0.77
SCHEMBL18082019 0.77
SCHEMBL28740940 0.69
SCHEMBL3082306 0.69
SCHEMBL1687587 0.69
SCHEMBL1039977 0.68
SCHEMBL3055662 0.67
SCHEMBL5838429 0.67
SCHEMBL11121181 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7632351-B2 Atomic layer deposition processes for the formation of ruthenium films, and ruthenium precursors useful in such processes E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-12-15 US claimed
EP-1913174-A1 ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES E.I.Du pont de nemours and company (US) 2008-04-23 EP claimed
WO-2007019437-A1 ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-02-15 WO claimed
US-20070037392-A1 Atomic layer deposition of ruthenium-containing films using surface-activating agents and novel ruthenium complexes E. I. DU PONT DE NEMOURS AND COMPANY 2007-02-15 US claimed