SCHEMBL4412403

SCHEMBL4412403

CC(C)O[Si](CCC#N)(OC(C)C)OC(C)C

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914257 0.88 TSHR (0.39) TSHRALDH1A1TDP1
SCHEMBL430819 0.76
SCHEMBL7764847 0.75
SCHEMBL235898 0.72 ALDH1A1 (0.37) TSHRALDH1A1TDP1
SCHEMBL428852 0.71
SCHEMBL705873 0.71
SCHEMBL3817298 0.70
SCHEMBL4407750 0.70 TSHR (0.40) TSHR
SCHEMBL13923675 0.69
SCHEMBL106557 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107863510-B Cyano-modified silicon oxide lithium battery negative electrode material and preparation method and application thereof 徐州凌云硅业股份有限公司 2020-07-24 CN disclosed
CN-108047921-B Waterborne polyurethane coating and preparation method thereof 江门市箭牌涂料有限公司 2020-03-06 CN disclosed
US-7638175-B2 Alignment film, method of forming the alignment film, liquid crystal panel, and electronic equipment SEIKO EPSON CORPORATION (JP) 2009-12-29 US disclosed
US-20060222785-A1 Alignment film, method of forming the alignment film, liquid crystal panel, and electronic equipment SEIKO EPSON CORPORATION 2006-10-05 US disclosed
EP-1708015-A2 Organic silicon-based (polysiloxane) alignment layers for liquid crystal displays Seiko Epson Corporation (JP) 2006-10-04 EP disclosed