SCHEMBL441360

SCHEMBL441360

c1ccc2c(Oc3cccc4c3ccc3ccccc34)cccc2c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 3/20 0.61
ALDH1A1 P00352 6/20 0.52
HSD17B10 Q99714 4/20 0.52
TDP1 Q9NUW8 3/20 0.52
CYP2A6 P11509 1/20 0.52
TSHR P16473 1/20 0.52
HTR1B P28222 3/20 0.46
PAX8 Q06710 1/20 0.45
HPGD P15428 2/20 0.44
HIF1A Q16665 1/20 0.44
CYP1B1 Q16678 1/20 0.44
CYP1A2 P05177 1/20 0.44
THRB P10828 1/20 0.44
KDM4E B2RXH2 2/20 0.43
KCNA3 P22001 1/20 0.43
GAA P10253 2/20 0.42
MAPT P10636 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
PGR P06401 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL446558 0.98 HPRT1 (0.64) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL442767 0.89 HTR1B (0.54) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL29577853 0.89 HTR1B (0.54) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL28188294 0.88 HPRT1 (0.56) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL28393054 0.87 HPRT1 (0.50) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
Lithium SCHEMBL6571336 0.86 HTR1B (0.52) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL7457103 0.86 HTR1B (0.52) ALDH1A1HSD17B10TDP1CYP2A6TSHR
Methane SCHEMBL10959030 0.86 HTR1B (0.52) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL27339322 0.86 HTR1B (0.52) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL27559989 0.86 HTR1B (0.52) ALDH1A1HSD17B10TDP1CYP2A6TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US claimed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US claimed
US-9045587-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-20140363768-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US disclosed