Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPRT1 | P00492 | 4/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | HTR1B | P28222 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL441360 | 0.98 | HPRT1 (0.61) | HPRT1ALDH1A1HSD17B10TDP1CYP2A6 | |
| SCHEMBL28188294 | 0.90 | HPRT1 (0.56) | HPRT1ALDH1A1HSD17B10TDP1CYP2A6 | |
| SCHEMBL28393054 | 0.89 | HPRT1 (0.50) | HPRT1ALDH1A1HSD17B10TDP1CYP2A6 | |
| SCHEMBL441525 | 0.88 | HPRT1 (0.54) | HPRT1ALDH1A1HSD17B10TDP1CYP2A6 | |
| SCHEMBL29577853 | 0.85 | HTR1B (0.54) | ALDH1A1HSD17B10TDP1CYP2A6TSHR | |
| SCHEMBL442767 | 0.85 | HTR1B (0.54) | ALDH1A1HSD17B10TDP1CYP2A6TSHR | |
| Lithium SCHEMBL6571336 | 0.83 | HTR1B (0.52) | ALDH1A1HSD17B10TDP1CYP2A6TSHR | |
| SCHEMBL7457103 | 0.83 | HTR1B (0.52) | ALDH1A1HSD17B10TDP1CYP2A6TSHR | |
| Methane SCHEMBL10959030 | 0.83 | HTR1B (0.52) | ALDH1A1HSD17B10TDP1CYP2A6TSHR | |
| Phosphine SCHEMBL28264511 | 0.83 | HTR1B (0.52) | ALDH1A1HSD17B10TDP1CYP2A6TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | claimed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | claimed |
| CN-110447539-B | Tissue culture method of bletilla striata seedlings | 普安县欣新生物科技有限责任公司 | 2023-03-28 | — | — | CN | disclosed |
| CN-115611956-A | Preparation method for co-production of bletilla polysaccharide and Militarine, product prepared by preparation method and application of product | 云南屈美生物科技有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-113018388-A | Use of anti-allergy composition in preparation of preparation and/or medicament for reducing irritation of azelaic acid | 谢志辉生物医药研究院(广州)有限公司 | 2021-06-25 | — | — | CN | disclosed |
| CN-107523644-B | Identification method of bletilla ochracea | 贵州医科大学 | 2021-01-26 | — | — | CN | disclosed |
| CN-109574809-B | Synthesis method of hydroxyl-substituted phenanthrene derivative | 华东理工大学 | 2020-07-03 | — | — | CN | disclosed |
| CN-106386054-A | Method for under-forest plantation of bletilla striata | 湖南苗苗乐生物科技有限公司 | 2017-02-15 | — | — | CN | disclosed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |