SCHEMBL441395

SCHEMBL441395

CCOC(CC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26986922 1.00
SCHEMBL25094 0.83
SCHEMBL15096678 0.81 THRB (0.42)
SCHEMBL7900909 0.80 LMNA (0.63)
Ammonia Solution, Strong SCHEMBL27897772 0.80 THRB (0.47)
SCHEMBL26030 0.79
SCHEMBL28715538 0.79 THRB (0.40)
SCHEMBL10647959 0.79 THRB (0.40)
SCHEMBL13211942 0.79 THRB (0.40)
SCHEMBL14764576 0.78 THRB (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305392-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-11739056-B2 Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-29 US disclosed
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
EP-3709426-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ENERGY DEVICE USING SAME Mitsubishi Chemical Corporation (JP) 2020-09-16 EP disclosed
US-20180065924-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-03-08 US disclosed
US-9845669-B2 Hydrocarbon recovery with multi-function agent CENOVUS ENERGY INC. (CA) 2017-12-19 US disclosed
US-20170305848-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-10-26 US disclosed
US-5719155-A CARDIOVASCULAR DISORDERS JAPAN TOBACCO INC. (JP) 1998-02-17 US disclosed
US-5616812-A POLYMERIZING VINYL ETHER IN THE PRESENCE OF CATALYST AND SPECIFIC ACETAL IDEMITSU KOSAN CO., LTD. (JP) 1997-04-01 US disclosed
US-5589597-A HYDROGENATION IDEMITSU KOSAN CO., LTD. (JP) 1996-12-31 US disclosed
US-5523491-A REACTING ACETAL OR KETAL COMPOUND WITH HYDROGEN IN PRESENCE OF HYDROGENATION AND SOLID ACID CATALYSTS IDEMITSU KOSAN CO., LTD. (JP) 1996-06-04 US disclosed
WO-1996005179-A1 SUBSTITUTED TRIAZOLINONES AS PLANT PROTECTIVE AGENTS BASF AKTIENGESELLSCHAFT (DE) 1996-02-22 WO disclosed
EP-0677519-A1 CHROMAN DERIVATIVE AND MEDICINAL USE THEREOF Japan Tobacco Inc. (JP) 1995-10-18 EP disclosed
EP-0644175-A1 POLYVINYL ETHER COMPOUND AND LUBRICATING OIL IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-03-22 EP disclosed
US-5399631-A Polyvinyl ether compound IDEMITSU KOSAN CO., LTD. (JP) 1995-03-21 US disclosed
EP-0034374-B1 SELECTIVE HOMOLOGATION OF ACETALS OR ETHERS TO MONOHYDRIC OR POLYHYDRIC ALCOHOLS UNION CARBIDE CORPORATION (US) 1983-08-03 EP disclosed
EP-0034374-A1 Selective homologation of acetals or ethers to monohydric or polyhydric alcohols UNION CARBIDE CORPORATION (US) 1981-08-26 EP disclosed