SCHEMBL4422952

SCHEMBL4422952

NC(=O)Cc1ccc2c(c1)Cc1ccccc1-2

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 1/20 0.53
HTR2C P28335 2/20 0.52
HTR2B P41595 2/20 0.52
DRD2 P14416 1/20 0.52
ADRA1D P25100 1/20 0.52
HTR2A P28223 1/20 0.52
HTR7 P34969 1/20 0.52
ADRA1A P35348 1/20 0.52
ADRA1B P35368 1/20 0.52
RAB9A P51151 5/20 0.50
NPC1 O15118 4/20 0.50
SMN1; SMN2 Q16637 4/20 0.50
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 2/20 0.50
LMNA P02545 1/20 0.50
MAPT P10636 1/20 0.50
HPGD P15428 1/20 0.50
TSHR P16473 3/20 0.49
ATM Q13315 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14711685 0.87 SRD5A1 (0.53) SRD5A2RAB9ANPC1SMN1; SMN2ALDH1A1
SCHEMBL9227114 0.85 SRD5A2 (0.58) SRD5A2HTR2CHTR2BRAB9ANPC1
SCHEMBL7107209 0.84 CA2 (0.55) RAB9ANPC1ALDH1A1KDM4EMAPT
Methane SCHEMBL3680766 0.84 SRD5A2 (0.57) SRD5A2HTR2CHTR2BRAB9ANPC1
SCHEMBL5134316 0.83 SLC1A3 (0.46) RAB9ANPC1ALDH1A1KDM4EMAPT
SCHEMBL27404895 0.80 HTR2C (0.49) SRD5A2HTR2CHTR2BDRD2ADRA1D
SCHEMBL27830632 0.80 SRD5A2 (0.53) SRD5A2HTR2CHTR2BRAB9ANPC1
SCHEMBL11084195 0.80 AKR1B1 (0.56) SRD5A2L3MBTL1AKR1B1
SCHEMBL28063985 0.80 TSHR (0.55) SRD5A2HTR2CHTR2BRAB9ANPC1
SCHEMBL3452644 0.79 SRD5A2 (0.54) SRD5A2HTR2CHTR2BALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100595894-C Palladium-selective etching solution and method for controlling etching selectivity KANTO KAGAKU 2010-03-24 CN disclosed
US-20090184092-A1 Palladium-Selective Etching Solution and Method for Controlling Etching Selectivity KANTO KAGAKU KABUASHIKI KAISHA (JP) 2009-07-23 US disclosed
CN-101297396-A Palladium-selective etching solution and method for controlling etching selectivity KANTO KAGAKU (JP) 2008-10-29 CN disclosed