SCHEMBL4423340

SCHEMBL4423340

O=C(Cc1cccc(O)c1)Nc1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.71
NLRP3 Q96P20 10/20 0.67
KMT2A Q03164 4/20 0.64
MEN1 O00255 3/20 0.64
MAPT P10636 1/20 0.64
HIF1A Q16665 1/20 0.60
SELP P16109 1/20 0.58
SELE P16581 1/20 0.58
USP2 O75604 1/20 0.56
ALDH1A1 P00352 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4423342 0.90 NLRP3 (0.75) EPHX2NLRP3KMT2AMEN1MAPT
SCHEMBL29520161 0.90 NLRP3 (0.75) EPHX2NLRP3KMT2AMEN1MAPT
SCHEMBL5102413 0.86 GAA (0.66) EPHX2NLRP3KMT2AMEN1MAPT
SCHEMBL5114611 0.86 NLRP3 (0.74) EPHX2NLRP3KMT2AMEN1MAPT
SCHEMBL5102596 0.84 MEN1 (0.64) NLRP3KMT2AMEN1SELPSELE
SCHEMBL1516167 0.84 EPHX2 (1.00) EPHX2KMT2AMEN1MAPTUSP2
SCHEMBL11285414 0.83 NLRP3 (0.74) EPHX2NLRP3KMT2AMEN1MAPT
SCHEMBL8349809 0.83 NLRP3 (0.58) NLRP3SELPSELE
SCHEMBL11900270 0.82 EPHX2 (0.81) EPHX2KMT2AMEN1MAPTUSP2
SCHEMBL7246711 0.82 KMT2A (0.61) NLRP3KMT2AMEN1SELPSELE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8187788-B2 Photosensitive resin composition and photosensitive film ASAHI KASEI KABUSHIKI KAISHA (JP) 2012-05-29 US claimed
US-20090191385-A1 Photosensitive Resin Composition and Photosensitive Film ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-07-30 US claimed
US-8187788-B2 Photosensitive resin composition and photosensitive film ASAHI KASEI KABUSHIKI KAISHA (JP) 2012-05-29 US disclosed
US-20090191385-A1 Photosensitive Resin Composition and Photosensitive Film ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-07-30 US disclosed