SCHEMBL4423342

SCHEMBL4423342

O=C(Cc1ccccc1)Nc1cccc(O)c1

nearest known ligand 0.75

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NLRP3 Q96P20 13/20 0.75
EPHX2 P34913 1/20 0.71
KMT2A Q03164 2/20 0.68
USP2 O75604 2/20 0.64
ALDH1A1 P00352 2/20 0.64
SMN1; SMN2 Q16637 1/20 0.64
LMNA P02545 1/20 0.64
CFD P00746 1/20 0.62
KDM4E B2RXH2 1/20 0.59
MEN1 O00255 1/20 0.59
POLB P06746 1/20 0.59
MAPT P10636 1/20 0.59
HPGD P15428 1/20 0.59
BLM P54132 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29520161 1.00 NLRP3 (0.75) NLRP3EPHX2KMT2AUSP2ALDH1A1
SCHEMBL4423340 0.90 EPHX2 (0.71) NLRP3EPHX2KMT2AUSP2ALDH1A1
SCHEMBL11900270 0.90 EPHX2 (0.81) EPHX2KMT2AUSP2ALDH1A1SMN1; SMN2
SCHEMBL1516167 0.84 EPHX2 (1.00) EPHX2KMT2AUSP2ALDH1A1SMN1; SMN2
SCHEMBL31505906 0.83 EPHX2 (0.71) EPHX2KMT2AUSP2ALDH1A1SMN1; SMN2
SCHEMBL6100233 0.83 EPHX2 (0.71) NLRP3EPHX2KMT2AUSP2ALDH1A1
SCHEMBL6098738 0.83 CFD (0.81) EPHX2KMT2AUSP2ALDH1A1SMN1; SMN2
SCHEMBL26994660 0.83 EPHX2 (0.71) EPHX2KMT2AUSP2ALDH1A1SMN1; SMN2
SCHEMBL10052144 0.83 NLRP3 (0.70) NLRP3EPHX2KMT2AALDH1A1KDM4E
SCHEMBL2747679 0.83 KDM4E (0.62) NLRP3EPHX2KMT2AUSP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8187788-B2 Photosensitive resin composition and photosensitive film ASAHI KASEI KABUSHIKI KAISHA (JP) 2012-05-29 US claimed
US-20090191385-A1 Photosensitive Resin Composition and Photosensitive Film ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-07-30 US claimed
US-8187788-B2 Photosensitive resin composition and photosensitive film ASAHI KASEI KABUSHIKI KAISHA (JP) 2012-05-29 US disclosed
US-20090191385-A1 Photosensitive Resin Composition and Photosensitive Film ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-07-30 US disclosed
US-3979202-A Meta-bifunctional benzenes and herbicidal compositions MONSANTO COMPANY (US) 1976-09-07 US disclosed