Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | STS | P08842 | 2/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.34 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.34 |
| ▸ | CYSLTR2 | Q9NS75 | 6/20 | 0.34 |
| ▸ | CYSLTR1 | Q9Y271 | 6/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.34 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | KDM4A | O75164 | 1/20 | 0.33 |
| ▸ | THRA | P10827 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diphenylsulfane SCHEMBL2901074 | 0.92 | NR1H2 (0.38) | STSNR1H2NR1H3CYSLTR2CYSLTR1 | |
| Hydrogen Sulfide SCHEMBL16581546 | 0.91 | STS (0.49) | STSCA1CA2CA9NR1H2 | |
| Iodide SCHEMBL15055563 | 0.91 | STS (0.49) | STSCA1CA2CA9NR1H2 | |
| Diphenylsulfane SCHEMBL2895610 | 0.89 | NR1H2 (0.34) | STSNR1H2NR1H3CYSLTR2CYSLTR1 | |
| Diphenylsulfane SCHEMBL2896008 | 0.88 | BID (0.38) | CYSLTR2CYSLTR1MEN1ALDH1A1MAPT | |
| SCHEMBL4599603 | 0.83 | LIPG (0.44) | NR1H2NR1H3CYSLTR2CYSLTR1LIPG | |
| SCHEMBL28991878 | 0.83 | LIPG (0.44) | NR1H2NR1H3CYSLTR2CYSLTR1LIPG | |
| Diphenylsulfane SCHEMBL2897538 | 0.81 | STS (0.43) | STSCA1CA2CA9MEN1 | |
| Iodobenzene SCHEMBL2898486 | 0.79 | PPARA (0.40) | MAPTLIPGPPARABIDBCL2L1 | |
| Diphenylsulfane SCHEMBL4423381 | 0.77 | CA1 (0.42) | STSCA1CA2CA9MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11249398-B2 | Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structures | JSR CORPORATION (JP) | 2022-02-15 | — | — | US | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| EP-1826612-A1 | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings | JSR Corporation (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20070196765-A1 | RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS | JSR CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| US-20070190465-A1 | Positively radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7105269-B2 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20050244747-A1 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |