SCHEMBL4425652

SCHEMBL4425652

O=C(Oc1ccc(Cl)cc1)c1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.65
KMT2A Q03164 12/20 0.61
MAPT P10636 3/20 0.61
ALDH1A1 P00352 3/20 0.61
TDP1 Q9NUW8 2/20 0.61
L3MBTL1 Q9Y468 1/20 0.61
PKM P14618 1/20 0.61
MEN1 O00255 5/20 0.59
SMN1; SMN2 Q16637 1/20 0.58
RAB9A P51151 1/20 0.57
CES2 O00748 1/20 0.55
CES1 P23141 1/20 0.55
ALOX15 P16050 1/20 0.54
HTT P42858 1/20 0.53
HSD17B10 Q99714 1/20 0.52
CASP3 P42574 1/20 0.51
SENP7 Q9BQF6 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL197094 0.92 KMT2A (0.63) PARP10KMT2AMAPTALDH1A1TDP1
SCHEMBL10599787 0.90 KMT2A (0.69) PARP10KMT2AMAPTALDH1A1MEN1
SCHEMBL28003430 0.90 KMT2A (0.69) PARP10KMT2AMAPTALDH1A1MEN1
SCHEMBL9683516 0.90 KMT2A (0.69) PARP10KMT2AMAPTALDH1A1MEN1
SCHEMBL610755 0.90 KMT2A (0.69) PARP10KMT2AMAPTALDH1A1MEN1
SCHEMBL725405 0.89 PARP10 (0.77) PARP10KMT2AMAPTALDH1A1TDP1
SCHEMBL6032517 0.89 PARP10 (0.57) PARP10KMT2AMAPTALDH1A1TDP1
SCHEMBL7739094 0.89 PARP10 (0.57) PARP10KMT2AMAPTALDH1A1TDP1
Hydrochloric Acid SCHEMBL16050040 0.87 PARP10 (0.74) PARP10KMT2AMAPTALDH1A1TDP1
SCHEMBL9663679 0.87 PARP10 (0.81) PARP10KMT2AMAPTALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62018288-A None JP disclosed
CN-119708924-A Ink, ink preparation method and ink-jet printing method 广东聚华印刷显示技术有限公司 2025-03-28 CN disclosed
CN-116751137-B Method for preparing chloro aromatic compound by photo-induced nitroarene denitration chlorination 华中师范大学 2025-03-07 CN disclosed
CN-114702390-B Preparation method of 4-chloro-3-nitroanisole 常州佳德医药科技有限公司 2024-07-30 CN disclosed
CN-116751137-A Method for preparing chloro aromatic compound by photo-induced nitroarene denitration chlorination 华中师范大学 2023-09-15 CN disclosed
CN-114702390-A Preparation method of 4-chloro-3-nitrobenzyl ether 常州佳德医药科技有限公司 2022-07-05 CN disclosed
CN-106831285-B Method for converting amide and urea into ester 湖北科技学院 2020-08-11 CN disclosed
CN-109232411-A A method of preparing boscalid 广东广康生化科技股份有限公司 2019-01-18 CN disclosed
EP-2909279-B1 HEAT ACTIVATED PRESSURE SENSITIVE ADHESIVE ROHM & HAAS (US) 2017-02-01 EP disclosed
US-9453148-B2 Heat activated pressure sensitive adhesive DOW GLOBAL TECHNOLOGIES LLC (US) 2016-09-27 US disclosed
CN-1054590-A The benzoic acid herbicides that 6-aryl-2-replaces FMC CORP (US) 1991-09-18 CN disclosed
US-4835312-A Production process of N-substituted amide compounds MITSUI CHEMICALS, INCORPORATED (JP) 1989-05-30 US disclosed
JP-S6218288-A THERMAL RECORDING MATERIAL MITSUI TOATSU CHEM INC 1987-01-27 JP disclosed
US-4495311-A METAL CHELATES OR SALTS AND BENZOYL COMPOUNDS AS ADDIVES PRINCETON POLYMER LABORATORIES, INC. (US) 1985-01-22 US disclosed
US-4479138-A PHENYL BENZOIC ESTER TO INCREASE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1984-10-23 US disclosed
US-4356295-A COORDINATION CATALYSTS MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1982-10-26 US disclosed
US-4259225-A STORAGE STABILITY DAINIPPON INK & CHEMICALS, INC. (JP) 1981-03-31 US disclosed
US-4026798-A PROLONGING USE FMC CORPORATION (US) 1977-05-31 US disclosed
US-4013575-A Dry cleaning with peracids FMC CORPORATION (US) 1977-03-22 US disclosed
US-3981856-A BIODEGRADATION, ADDITION POLYMERS PRINCETON POLYMER LABORATORIES, INCORPORATED (US) 1976-09-21 US disclosed