SCHEMBL4427601

SCHEMBL4427601

FC(F)=C(F)OCBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6671203 0.74
SCHEMBL3681120 0.71
SCHEMBL11910326 0.67
SCHEMBL5478674 0.67
SCHEMBL5147703 0.65
SCHEMBL453363 0.65
SCHEMBL546039 0.65 HTT (0.44)
SCHEMBL233481 0.63
SCHEMBL2623204 0.63 TSHR (0.35)
SCHEMBL9419727 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1227128-B1 Fuser system member comprising chlorofluoro elastomer compositions XEROX CORP (US) 2009-08-19 EP disclosed
US-7307112-B2 Electrical component with fillers having semi-resistive properties and composite systems comprising the same XEROX CORPORATION (US) 2007-12-11 US disclosed
US-6759118-B2 FLUOROELASTOMER CONTAINING HIGH LEVEL OF PARTICLES TREATED WITH 3-GLYCIDOXYPROPYLTRIMETHOXYSILANE; WEAR RESISTANCE; THERMAL CONDUCTIVITY; REDUCED DROP OUT DURING SOLVENT COATING XEROX CORPORATION 2004-07-06 US disclosed
US-6680095-B2 TRIAMINOPOLYSILOXANES HAVING STERICALLY LARGE SILOXANE GROUPS; SURFACE RELEASE LAYERS FOR FUSING SYSTEMS USED IN ELECTROSTATOGRAPHIC IMAGING SYSTEMS. XEROX CORPORATION 2004-01-20 US disclosed
US-20040005421-A1 Chlorofluoro elastomer compositions for use in electrophotographic fusing applications XEROX CORPORATION 2004-01-08 US disclosed
US-20030156867-A1 Electrophotographic system with member formed from boron nitride filler coupled to a silane XEROX CORPORATION 2003-08-21 US disclosed
US-20030144388-A1 Electrical component with fillers having semi-resistive properties and composite systems comprising the same XEROX CORPORATION. 2003-07-31 US disclosed
US-20020132074-A1 Chlorofluoro elastomer compositions for use in electrophotoraphic fusing applications XEROX CORPORATION 2002-09-19 US disclosed
US-20020102374-A1 Triaminopolysiloxanes having sterically large siloxane groups; surface release layers for fusing systems used in electrostatographic imaging systems. XEROX CORPORATION 2002-08-01 US disclosed
EP-1227128-A1 Chlorofluoro elastomer compositions for use in electrophotographic fusing applications Xerox Corporation (US) 2002-07-31 EP disclosed
EP-0735441-B1 Thin, thermally conductive fluoroelastomer coated fuser member XEROX CORP (US) 2001-10-24 EP disclosed
US-6289587-B1 Method to renew a spent fuser member XEROX CORPORATION 2001-09-18 US disclosed
US-5729813-A Thin, thermally conductive fluoroelastomer coated fuser member XEROX CORPORATION (US) 1998-03-17 US disclosed
EP-0735441-A1 Thin, thermally conductive fluoroelastomer coated fuser member XEROX CORPORATION (US) 1996-10-02 EP disclosed