Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | CHRNB3 | Q05901 | 1/20 | 0.42 |
| ▸ | CHRNA6 | Q15825 | 1/20 | 0.42 |
| ▸ | MIF | P14174 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.31 |
| ▸ | RELA | Q04206 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
| ▸ | PREP | P48147 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13359529 | 0.80 | USP2 (0.46) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL1691605 | 0.80 | USP2 (0.46) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL16614310 | 0.80 | USP2 (0.46) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL14065524 | 0.79 | ALDH1A1 (0.43) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL10315910 | 0.77 | ALDH1A1 (0.63) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL19259373 | 0.77 | USP2 (0.41) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL21247138 | 0.75 | EPHX1 (0.34) | MIF | |
| SCHEMBL28857857 | 0.75 | TDP1 (0.42) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL19259374 | 0.75 | ALDH1A1 (0.49) | USP2ALDH1A1ALOX15TDP1CHRNB2 | |
| SCHEMBL12987236 | 0.74 | USP2 (0.44) | USP2ALDH1A1ALOX15TDP1CHRNB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1112603-C | Method and device using ArF photoresist | HYUNDAI ELECTRONICS IND (KR) | 2003-06-25 | — | — | CN | claimed |
| US-6045967-A | Method and device using ArF photoresist | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-04-04 | — | — | US | claimed |
| CN-1191333-A | Method and device using ArF photoresist | HYUNDAI ELECTRONICS IND (KR) | 1998-08-26 | — | — | CN | claimed |
| JP-10207070-A | — | — | None | — | — | JP | disclosed |
| US-7511179-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2009-03-31 | — | — | US | disclosed |
| US-20060251991-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2006-11-09 | — | — | US | disclosed |
| US-7115690-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2006-10-03 | — | — | US | disclosed |
| US-20060204893-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040191680-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2004-09-30 | — | — | US | disclosed |
| EP-1449860-A1 | NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS | Daikin Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| CN-1112603-C | Method and device using ArF photoresist | HYUNDAI ELECTRONICS IND (KR) | 2003-06-25 | — | — | CN | disclosed |
| US-6316565-B1 | FOR FORMING PATTERNS OF INTEGRATED SEMICONDUCTOR DEVICE, RESOLUTION IN PHOTOLITHOGRAPHY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-11-13 | — | — | US | disclosed |
| US-6045967-A | Method and device using ArF photoresist | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-04-04 | — | — | US | disclosed |
| CN-1191333-A | Method and device using ArF photoresist | HYUNDAI ELECTRONICS IND (KR) | 1998-08-26 | — | — | CN | disclosed |