⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL194058 | 0.77 | — | — | |
| SCHEMBL23487027 | 0.77 | FDPS (0.31) | — | |
| SCHEMBL3248717 | 0.77 | — | — | |
| SCHEMBL529708 | 0.71 | FDPS (0.32) | — | |
| SCHEMBL9705188 | 0.70 | LMNA (0.30) | — | |
| SCHEMBL1573499 | 0.69 | — | — | |
| SCHEMBL3493431 | 0.69 | — | — | |
| SCHEMBL16178309 | 0.67 | FDPS (0.35) | — | |
| SCHEMBL9342488 | 0.67 | — | — | |
| SCHEMBL16668255 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5731128-A | ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY | NIPPON PAINT CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| US-4046762-A | CENTRAL NERVOUS SYSTEM INHIBITORS | INSTITUTO LUSO FARMACO D'ITALIA S.R.L. (IT) | 1977-09-06 | — | — | US | claimed |
| EP-2088468-B1 | Method of preparing lithographic printing plate and lithographic printing plate precursor | FUJIFILM CORP (JP) | 2016-05-18 | — | — | EP | disclosed |
| EP-2088468-A1 | Method of preparing lithographic printing plate and lithographic printing plate precursor | FUJIFILM Corporation (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-20080287537-A1 | Composition, Particularly a Cosmetic Composition, Comprising ((Dialkylamino)Alkoxy) Ethanol Ester | L'OREAL (FR) | 2008-11-20 | — | — | US | disclosed |
| US-20080098892-A1 | Contacting with aqueous absorption medium containing tertiary aliphatic amine and activator having primary and secondary aliphatic amine functionality | BASF AKTIENGESELLSCHAFT PATENTS, TRADEMARKS AND LICENSES (DE) | 2008-05-01 | — | — | US | disclosed |
| EP-0675412-B1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5861232-A | FLEXOGRAPHIC PLATE | NIPPON PAINT CO., LTD. (JP) | 1999-01-19 | — | — | US | disclosed |
| EP-0745900-B1 | Water-developing photosensitive resin composition | NIPPON PAINT CO LTD (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5830620-A | MUTILAYER; SUBSTRATE, PHOTOSENSITIVE RESIN, SLIP LAYER AND COVERINGS | NIPPON PAINT CO., LTD. (JP) | 1998-11-03 | — | — | US | disclosed |
| US-5731129-A | Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0607962-A1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-07-27 | — | — | EP | disclosed |
| EP-0261910-B1 | Water-developable photosensitive plate and its production | NIPPON PAINT CO LTD (JP) | 1994-03-30 | — | — | EP | disclosed |
| EP-0533459-A1 | Photocurable composition and its use | W.R. Grace & Co.-Conn. (US) | 1993-03-24 | — | — | EP | disclosed |
| US-5175076-A | Copolymer resin for light sensitive elements of diene, alpha, beta-unsaturated carboxylic acids and vinyl monomers, a basic nitrogen compound and an unsaturated monomer | NIPPON PAINT CO., LTD. (JP) | 1992-12-29 | — | — | US | disclosed |
| EP-0513493-A1 | Photosensitive resin composition | Nippon Paint Co., Ltd. (JP) | 1992-11-19 | — | — | EP | disclosed |
| US-5143819-A | Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles | W. R. GRACE & CO.-CONN. (US) | 1992-09-01 | — | — | US | disclosed |
| US-5073477-A | Conjugated diene homo and copolymers, unsaturated amine, unsat urated monomer, plate with good strength that can be developed in water | NIPPON PAINT CO., LTD. (JP) | 1991-12-17 | — | — | US | disclosed |
| WO-1988002135-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE PLATE AND ITS PRODUCTION | NAPP SYSTEMS (USA), INC. (US) | 1988-03-24 | — | — | WO | disclosed |
| US-4046762-A | CENTRAL NERVOUS SYSTEM INHIBITORS | INSTITUTO LUSO FARMACO D'ITALIA S.R.L. (IT) | 1977-09-06 | — | — | US | disclosed |