SCHEMBL4434627

SCHEMBL4434627

CC(=CCCOP)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CD81 P60033 2/20 0.37
PPARG P37231 1/20 0.33
BACE1 P56817 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19466570 0.88 CD81 (0.35) CD81PPARGBACE1
SCHEMBL5417273 0.86 EP300 (0.37) CD81PPARGBACE1
SCHEMBL15535508 0.82 CD81 (0.39) CD81PPARGBACE1
SCHEMBL137136 0.80 CD81 (0.38) CD81PPARGBACE1
SCHEMBL621263 0.80 CD81 (0.38) CD81PPARGBACE1
SCHEMBL6851328 0.80 CD81 (0.38) CD81PPARGBACE1
SCHEMBL6851323 0.80 CD81 (0.38) CD81PPARGBACE1
SCHEMBL406199 0.78 ALOX15 (0.47) CD81PPARG
SCHEMBL6363352 0.78 CD81 (0.37) CD81PPARGBACE1
SCHEMBL8068610 0.78 CD81 (0.37) CD81PPARGBACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10472525-B2 Use of dithiophosphinic acid and/or its salts for producing anti-corrosion coatings that are devoid of chrome BASF COATINGS GMBH (DE) 2019-11-12 US disclosed
US-20180362873-A1 SLIDING MEMBER, COMPONENT AND NOISE REDUCING METHOD FOR MECHANICAL APPARATUS, EXCLUDING THOSE USED FOR IMAGE FORMING APPARATUS DUPONT TORAY SPECIALTY MATERIALS KABUSHIKI KAISHA (JP) 2018-12-20 US disclosed
EP-3388501-A1 SLIDING MEMBER EXCLUDING THOSE USED FOR IMAGE FORMATION DEVICE, COMPONENT, AND METHOD FOR REDUCING NOISE IN MACHINE DEVICE Dow Corning Toray Co., Ltd. (JP) 2018-10-17 EP disclosed
US-20170349762-A1 WATER-BASED COATING AGENT COMPOSITION, WATER-BASED LUBRICATING FILM PAINT COMPOSITION COMPRISING SAME, AND MEMBER DUPONT TORAY SPECIALTY MATERIALS KABUSHIKI KAISHA (JP) 2017-12-07 US disclosed
EP-3235887-A1 WATER-BASED COATING AGENT COMPOSITION, WATER-BASED LUBRICATING FILM PAINT COMPOSITION COMPRISING SAME, AND MEMBER Dow Corning Toray Co., Ltd. (JP) 2017-10-25 EP disclosed
US-20160168390-A1 USE OF DITHIOPHOSPHINIC ACID AND/OR ITS SALTS FOR PRODUCING ANTI-CORROSION COATINGS THAT ARE DEVOID OF CHROME BASF AKTIENGESELLSCHAFT (DE) 2016-06-16 US disclosed
US-7638469-B2 Methods of increasing permeability in carbonatic rock formations with alkanesulfonic acids BASF SE (DE) 2009-12-29 US disclosed
US-20080153718-A1 Use of Water-Soluble Alkane Sulfonic Acids For Increasing the Permeability of Underground Petroliferous and/or Gas-Bearing Carbonate Rock Formations and For Dissolving Carbonate Contaminants and/or Contaminants Containing Carbonates During Petroleum Production BASF AKTIENGESELLSCHAFT (DE) 2008-06-26 US disclosed
US-20070298337-A1 MICROCAPSULES AND PROCESSES FOR PRODUCING THE SAME HAYASHI MASAKI 2007-12-27 US disclosed
US-7279121-B2 Process for producing electrophoretic microcapsules DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-10-09 US disclosed
US-5405738-A A perfect cubic silver halide grains are spectrally sensitized with sensitizing dyes; photosensitivity, contrast, high color density, image quality FUJI PHOTO FILM CO., LTD. (JP) 1995-04-11 US disclosed
US-5370984-A Containing an addition polymer FUJI PHOTO FILM CO., LTD. (JP) 1994-12-06 US disclosed
EP-0576880-A1 Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1994-01-05 EP disclosed
EP-0567083-A1 Silver halide photographic lightsensitive material FUJI PHOTO FILM CO., LTD. (JP) 1993-10-27 EP disclosed
US-5139892-A Improved dispersion, abrasion resistance characteristics SEKISUI KAGAKU KOGYO KABUSHIKI (JP) 1992-08-18 US disclosed
US-5037893-A Resin used for magnetic recording media derived from vinyl chloride and quaternary monomer SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-08-06 US disclosed
US-5028676-A Improved dispersion characteristics SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-07-02 US disclosed
EP-0432946-A1 Charge control resin particles and a method of manufacturing the same MITA INDUSTRIAL CO., LTD. (JP) 1991-06-19 EP disclosed
US-4996272-A Vinyl chloride, vinyl monomer containing hydroxy groups, vinyl monomer containing quaternary ammonium group SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-02-26 US disclosed
US-4861683-A TERPOLYMER OF VINYL CHLORIDE, VINYL MONOMER CONTAINING HYDROXY GROUPS, AND VINYL MONOMER CONTAINING QUATERNARY AMMONIUM GROUPS SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-08-29 US disclosed