SCHEMBL4435261

SCHEMBL4435261

COC(=O)C1(N=NC2(C(=O)O)CCCCC2)CCCCC1

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.46
CYP3A4 P08684 3/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
MAPT P10636 1/20 0.36
TSHR P16473 1/20 0.35
CYP4F2 P78329 1/20 0.35
CYP4A11 Q02928 1/20 0.35
ALDH1A1 P00352 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
CYP2C19 P33261 1/20 0.31
LMNA P02545 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1274802 0.92 NPSR1 (0.52) NPSR1CYP3A4MEN1KMT2AMAPT
SCHEMBL1274800 0.92 NPSR1 (0.52) NPSR1CYP3A4MEN1KMT2AMAPT
SCHEMBL8165164 0.83 CYP2C19 (0.41) TSHRALDH1A1CYP2C19LMNASMN1; SMN2
SCHEMBL8165163 0.83 CYP2C19 (0.41) TSHRALDH1A1CYP2C19LMNASMN1; SMN2
SCHEMBL3036312 0.81 CYP2C19 (0.37) NPSR1TSHRALDH1A1CYP2C19LMNA
SCHEMBL4099215 0.73 NPSR1 (0.46) NPSR1CYP3A4MEN1KMT2AMAPT
SCHEMBL243441 0.73 NPSR1 (0.46) NPSR1CYP3A4MEN1KMT2AMAPT
SCHEMBL12370786 0.73 NPSR1 (0.36) NPSR1CYP3A4MEN1KMT2ACYP4F2
SCHEMBL902070 0.71 NPSR1 (0.47) NPSR1CYP3A4MEN1KMT2AMAPT
SCHEMBL9806701 0.71 NPSR1 (0.47) NPSR1CYP3A4MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119451999-A Methacrylic resin, method for producing same, resin composition, and resin film 株式会社钟化 2025-02-14 CN claimed
EP-4050042-B1 DEVELOPING APPARATUS, ELECTROPHOTOGRAPHY PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS CANON KK (JP) 2026-03-04 EP disclosed
CN-119451999-A Methacrylic resin, method for producing same, resin composition, and resin film 株式会社钟化 2025-02-14 CN disclosed
CN-111808421-B Composition for low dielectric heat dissipation film and low dielectric heat dissipation film 信越化学工业株式会社 2025-02-11 CN disclosed
CN-119317650-A Methacrylic resin, method for producing same, resin composition, coating material, and resin film 株式会社钟化 2025-01-14 CN disclosed
CN-113811521-B Process for producing fluorinated iodinated organic compounds 大金工业株式会社 2024-07-09 CN disclosed
US-11650516-B2 Developing apparatus, electrophotography process cartridge, and electrophotographic image forming apparatus CANON KABUSHIKI KAISHA (JP) 2023-05-16 US disclosed
EP-4050042-A1 DEVELOPING APPARATUS, ELECTROPHOTOGRAPHY PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-08-31 EP disclosed
US-20220236663-A1 DEVELOPING APPARATUS, ELECTROPHOTOGRAPHY PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-07-28 US disclosed
CN-111669969-B Base material and copolymer AGC株式会社 2022-02-25 CN disclosed
US-10746225-B2 Photocurable resin composition and sliding member MINEBEA MITSUMI INC. (JP) 2020-08-18 US disclosed
US-20190301530-A1 PHOTOCURABLE RESIN COMPOSITION AND SLIDING MEMBER META PLATFORMS, INC. 2019-10-03 US disclosed
EP-1767564-B2 POLYMER, A METHOD FOR PRODUCING THE POLYMER, AND A CEMENT ADMIXTURE USING THE SAME NIPPON CATALYTIC CHEM IND (JP) 2013-09-25 EP disclosed
EP-1767564-B1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON CATALYTIC CHEM IND (JP) 2009-11-11 EP disclosed
US-20070073015-A1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-29 US disclosed
EP-1767564-A2 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-28 EP disclosed