SCHEMBL4437477

SCHEMBL4437477

CCCC/C=C/CC[Si](OC)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.42
LPAR2 Q9HBW0 3/20 0.40
LPAR3 Q9UBY5 3/20 0.40
FAAH O00519 2/20 0.37
TRPV1 Q8NER1 1/20 0.37
F7 P08709 1/20 0.36
F3 P13726 1/20 0.36
LPAR1 Q92633 2/20 0.36
FABP3 P05413 5/20 0.35
EPHX2 P34913 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4437478 1.00 LMNA (0.42) LMNALPAR2LPAR3FAAHTRPV1
SCHEMBL29029659 0.87 LMNA (0.48) LMNALPAR2LPAR3FAAHTRPV1
SCHEMBL31351387 0.86 LMNA (0.36) LMNA
SCHEMBL2713411 0.83 LMNA (0.53) LMNALPAR2LPAR3FAAHTRPV1
SCHEMBL28079118 0.82 LMNA (0.42) LMNA
SCHEMBL31351363 0.82 LMNA (0.42) LMNALPAR2LPAR3FAAHTRPV1
SCHEMBL31351402 0.82 LPAR3 (0.40) LMNALPAR2LPAR3FAAHTRPV1
SCHEMBL28422758 0.81 LPAR2 (0.34) LMNALPAR2LPAR3LPAR1FABP3
SCHEMBL31351447 0.80 FAAH (0.35) LPAR2LPAR3FAAHTRPV1F7
SCHEMBL31351431 0.80 EPHX2 (0.37) LPAR2LPAR3FAAHTRPV1F7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7591921-B2 Heat-decaying materials, transfer sheet using the same, and patterning method SEKISUI CHEMICAL CO., LTD. (JP) 2009-09-22 US disclosed
US-20050276934-A1 Thermally vanishing material, transfer sheet using the same, and method for forming pattern SEKISUI CHEMICAL CO., LTD. (JP) 2005-12-15 US disclosed
EP-1566410-A1 THERMALLY VANISHING MATERIAL, TRANSFER SHEET USING THE SAME, AND METHOD FOR FORMING PATTERN SEKISUI CHEMICAL CO., LTD. (JP) 2005-08-24 EP disclosed