Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.35 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10272288 | 1.00 | TSHR (0.42) | TSHRSMN1; SMN2MGAMGAASI | |
| SCHEMBL15910174 | 0.88 | SMN1; SMN2 (0.42) | TSHRSMN1; SMN2ALDH1A1CA1CA2 | |
| Dimethylformamide SCHEMBL7693416 | 0.87 | TSHR (0.36) | TSHRSMN1; SMN2ALDH1A1CA1CA2 | |
| SCHEMBL7697129 | 0.86 | TSHR (0.35) | TSHRMGAMGAASIMGAM2 | |
| SCHEMBL445591 | 0.84 | ALDH1A1 (0.42) | TSHRMGAMGAASIMGAM2 | |
| SCHEMBL10405009 | 0.83 | HSD17B10 (0.50) | TSHRSMN1; SMN2CA1CA2HSD17B10 | |
| SCHEMBL26896482 | 0.83 | HSD17B10 (0.50) | TSHRSMN1; SMN2CA1CA2HSD17B10 | |
| SCHEMBL10946459 | 0.82 | TSHR (0.39) | TSHRSMN1; SMN2ALDH1A1CA1CA2 | |
| SCHEMBL13502934 | 0.82 | ALDH1A1 (0.37) | TSHRMGAMGAASIMGAM2 | |
| SCHEMBL15701335 | 0.82 | SMN1; SMN2 (0.38) | TSHRSMN1; SMN2ALDH1A1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-0629671-B1 | Solvent composition | MITSUBISHI RAYON CO (JP) | 2002-03-27 | — | — | EP | claimed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| EP-1016698-A1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| US-5630945-A | RECOVERING STYRENE, POLYESTER AND ACRYLIC RESIN FROM WASTE AS A SOLUTION AND RECOVERING SOLVENT WITH OXYISOBUTYRIC ACID ESTER | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-05-20 | — | — | US | claimed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | claimed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | claimed |
| JP-8081698-A | — | — | None | — | — | JP | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| CN-109313397-B | Method for manufacturing laminate, method for manufacturing semiconductor element, and laminate | 富士胶片株式会社 | 2023-04-11 | — | — | CN | disclosed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |
| US-5630945-A | RECOVERING STYRENE, POLYESTER AND ACRYLIC RESIN FROM WASTE AS A SOLUTION AND RECOVERING SOLVENT WITH OXYISOBUTYRIC ACID ESTER | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-05-20 | — | — | US | disclosed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | disclosed |
| JP-H0881698-A | DETERGENT COMPOSITION | NITTO CHEM IND CO LTD | 1996-03-26 | — | — | JP | disclosed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | disclosed |
| US-4978754-A | REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1990-12-18 | — | — | US | disclosed |
| EP-0321256-A2 | Process of preparing unsaturated carboxylic acid amides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-06-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | TSHR 2382/4885SMN1; SMN2 2354/4885MGAM 2617/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | TSHR 636/4885SMN1; SMN2 3100/4885MGAM 3579/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | TSHR 761/4885SMN1; SMN2 1754/4885MGAM 1132/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.