SCHEMBL4444502

SCHEMBL4444502

CCOCC([O])=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8735593 0.88 ALDH1A1 (0.54)
SCHEMBL5356822 0.79
SCHEMBL5164558 0.79
SCHEMBL2373813 0.79
Bicarbonate SCHEMBL28176096 0.79 FFAR3 (0.42)
SCHEMBL1114621 0.78 ALDH1A1 (0.42)
Ether SCHEMBL7854226 0.78 ALDH1A1 (0.42)
Ether SCHEMBL613941 0.76
Ether SCHEMBL9339223 0.76 ALDH1A1 (0.46)
SCHEMBL21831931 0.75 ALDH1A1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0758231-A1 TAXANE CLASS DERIVATIVE BASED PHARMACEUTICAL COMPOSITIONS Aventis Pharma S.A. (FR) 1997-02-19 EP claimed
WO-1995028923-A1 TAXANE CLASS DERIVATIVE BASED PHARMACEUTICAL COMPOSITIONS RHONE-POULENC RORER S.A. (FR) 1995-11-02 WO claimed
US-20240231226-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-11 US disclosed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20240210823-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-12013636-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-18 US disclosed
US-20240142872-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-02 US disclosed
US-11899363-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-02-13 US disclosed
US-20240004289-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-04 US disclosed
US-20230418159-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-12-28 US disclosed
EP-0524401-A1 Thiazolazo dyestuffs with a coupling component of the diphenylamine series BASF Aktiengesellschaft (DE) 1993-01-27 EP disclosed
EP-0134446-B1 NEGATIVE PHOTORESIST FORMULATIONS WITH RADIATION-ABSORBING ADDITIVES MERCK PATENT GmbH (DE) 1987-05-20 EP disclosed
US-4591650-A PLANT GROWTH REGULATORS SCHERING AKTIENGESELLSCHAFT (DE) 1986-05-27 US disclosed
US-4556737-A ANTIALLERGENS, TREATMENT OF ASTHMA AND RHINITIS TAIHO PHARMACEUTICAL COMPANY LIMITED (JP) 1985-12-03 US disclosed
US-4415494-A BLUE-TO-BLACK COLORFAST DISPERSE, NITRO DYES; DIAZOTIZING A P-NITROANILINE AND COUPLING WITH AN N-SUBSTITUTED 1-NAPHTHYLAMINE CASSELLA AKTIENGESELLSCHAFT (DE) 1983-11-15 US disclosed
EP-0036545-A1 Water insoluble monoazo dyes, their preparation and their use CASSELLA Aktiengesellschaft (DE) 1981-09-30 EP disclosed
US-4245109-A Process for producing astaxanthin HOFFMANN-LA ROCHE INC. (US) 1981-01-13 US disclosed
US-4204073-A Process for producing carotenoids HOFFMANN-LA ROCHE INC. (US) 1980-05-20 US disclosed
US-4156090-A Polyene compounds HOFFMANN-LA ROCHE INC. (US) 1979-05-22 US disclosed