Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.90 |
| ▸ | MAOA | P21397 | 2/20 | 0.71 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.67 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.67 |
| ▸ | MAOB | P27338 | 3/20 | 0.59 |
| ▸ | BCHE | P06276 | 1/20 | 0.58 |
| ▸ | MEN1 | O00255 | 1/20 | 0.58 |
| ▸ | CDC25B | P30305 | 1/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.58 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.56 |
| ▸ | MAPK14 | Q16539 | 2/20 | 0.53 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.53 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.52 |
| ▸ | PARP1 | P09874 | 1/20 | 0.52 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.52 |
| ▸ | PARP11 | Q9NR21 | 1/20 | 0.52 |
| ▸ | MIF | P14174 | 6/20 | 0.52 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.52 |
| ▸ | PKM | P14618 | 1/20 | 0.52 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29437756 | 1.00 | CES1 (0.90) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL29408351 | 1.00 | CES1 (0.90) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL13712393 | 0.94 | CES1 (1.00) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL11144928 | 0.90 | CES1 (0.73) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL29384891 | 0.87 | CES1 (0.77) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL2231281 | 0.87 | CES1 (0.77) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL1739155 | 0.84 | CES1 (0.71) | CES1MAOAL3MBTL1TDP1MAOB | |
| SCHEMBL5508289 | 0.84 | CES1 (0.71) | CES1MAOAL3MBTL1TDP1MAOB | |
| Anthrone SCHEMBL18143 | 0.83 | MAOA (1.00) | CES1MAOAL3MBTL1TDP1MAOB | |
| Anthrone SCHEMBL29357010 | 0.83 | MAOA (1.00) | CES1MAOAL3MBTL1TDP1MAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4700 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122037808-A | Adhesive tape | 长兴材料工业股份有限公司 | 2026-05-15 | — | — | CN | claimed |
| CN-116444502-B | Organic light-emitting compound containing dibenzosuberone, preparation method and application | 华南理工大学 | 2025-04-11 | — | — | CN | claimed |
| CN-111936117-B | Covalent treatment of keratin-containing materials | 生活实验公司 | 2025-01-07 | — | — | CN | claimed |
| CN-119080989-A | Resin polymer, photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2024-12-06 | — | — | CN | claimed |
| US-20240343853-A1 | COPOLYMER AND HOT MELT COMPOSITIONS COMPRISING SAID COPOLYMER | HENKEL AG & CO KGAA (DE) | 2024-10-17 | — | — | US | claimed |
| US-20240327322-A1 | Crosslinked Polymers with Tunable Coefficients of Thermal Expansion | NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC | 2024-10-03 | — | — | US | claimed |
| CN-118290657-A | Photocurable composition and application thereof | 常州强力先端电子材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-117860615-A | Covalent treatment of keratin-containing materials | 生活实验公司 | 2024-04-12 | — | — | CN | claimed |
| CN-117343638-A | Porous spin-on dielectric coating materials from silicon-containing polymers | 上海艾深斯科技有限公司 | 2024-01-05 | — | — | CN | claimed |
| EP-3864002-B1 | ADDITION-FRAGMENTATION AGENT WITH PENDENT AMINE GROUPS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2023-12-27 | — | — | EP | claimed |
| US-4560787-A | CYCLOCONDENSATION, ACID CATALYSTS, TRICHLOROMETHYL BENZENE | DYNAMIT NOBEL AG (DE) | 1985-12-24 | — | — | US | claimed |
| EP-0160473-A2 | Crosslinkable chemical formulation and composite semipermeable membrane made therewith | W.L. GORE & ASSOCIATES, INC. (US) | 1985-11-06 | — | — | EP | claimed |
| EP-0154237-A2 | Photopolymer for use as a solder mask | W.R. GRACE & CO.-CONN. (US) | 1985-09-11 | — | — | EP | claimed |
| EP-0060754-B1 | PHOTOINITIATED MERCAPTAM SYNTHESIS | SOCIETE NATIONALE ELF AQUITAINE (PRODUCTION) (FR) | 1985-06-19 | — | — | EP | claimed |
| US-4481281-A | PHOTORESISTS FOR PRINTED CIRCUITS | W. R. GRACE & CO. (US) | 1984-11-06 | — | — | US | claimed |
| US-4442198-A | PHOTORESISTS | W. R. GRACE & CO. (US) | 1984-04-10 | — | — | US | claimed |
| EP-0075698-A2 | Process for the preparation of 10,11-dihydro-5H-dibenzo(a,d) cyclohepten-5-on and its substitution products | HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) | 1983-04-06 | — | — | EP | claimed |
| EP-0060754-A1 | Photoinitiated mercaptam synthesis | SOCIETE NATIONALE ELF AQUITAINE (PRODUCTION) (FR) | 1982-09-22 | — | — | EP | claimed |
| US-4048036-A | CURING, PHOTOINITIATOR | PPG INDUSTRIES, INC. (US) | 1977-09-13 | — | — | US | claimed |
| US-3959103-A | Photocuring of unsaturated polyester/polythiol compositions | W. R. GRACE & CO. (US) | 1976-05-25 | — | — | US | claimed |