Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 3/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26360493 | 0.83 | CYP1A2 (0.45) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL12903287 | 0.82 | ALDH1A1 (0.64) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL10064380 | 0.79 | ALDH1A1 (0.55) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL26356325 | 0.78 | CYP1A2 (0.41) | ALDH1A1CYP1A2CA1CA9PRKCA | |
| SCHEMBL9248680 | 0.78 | ALDH1A1 (0.83) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL24326021 | 0.78 | CYP1A2 (0.42) | ALDH1A1CYP3A4CYP1A2CA1CA9 | |
| SCHEMBL9610631 | 0.77 | ALDH1A1 (0.57) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL13386515 | 0.77 | ALDH1A1 (0.53) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL9577034 | 0.76 | ALDH1A1 (0.70) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL6721695 | 0.76 | CYP1A2 (0.38) | ALDH1A1TSHRCYP3A4CYP1A2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4560309-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | National Institute for Materials Science (JP) | 2025-05-28 | — | — | EP | disclosed |
| CN-114315766-B | Preparation method of photoresist resin monomer containing lactone structure | 徐州博康信息化学品有限公司 | 2024-12-27 | — | — | CN | disclosed |
| WO-2023228843-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228842-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228841-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023189503-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE | JSR株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023189502-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE | JSR株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023090129-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2023-05-25 | — | — | WO | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| EP-1767539-A1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL COMPANY, LTD. (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-7144675-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-12-05 | — | — | US | disclosed |
| US-6753124-B2 | AMPLIFIED POSITIVE PHOTORESISTS | JSR CORPORATION (JP) | 2004-06-22 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-6258895-B1 | Polymers having spiro orthoester groups, process of manufacturing and using | THE PROCTER & GAMBLE COMPANY | 2001-07-10 | — | — | US | disclosed |
| EP-0575667-B1 | Process for the manufacture of polymers having spiro orthoester groups, the polymers obtained and their use | PROCTER & GAMBLE (US) | 2000-03-08 | — | — | EP | disclosed |
| WO-1994000501-A1 | POLYMERS HAVING SPIRO ORTHOESTER GROUPS, PROCESS OF MANUFACTURING AND USING | THE PROCTER & GAMBLE COMPANY (US) | 1994-01-06 | — | — | WO | disclosed |
| EP-0575667-A1 | Process for the manufacture of polymers having spiro orthoester groups, the polymers obtained and their use | THE PROCTER & GAMBLE COMPANY (US) | 1993-12-29 | — | — | EP | disclosed |