Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 4/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | PPARG | P37231 | 3/20 | 0.42 |
| ▸ | PTGES | O14684 | 1/20 | 0.42 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.42 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.41 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.40 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.40 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.40 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | PPARD | Q03181 | 1/20 | 0.39 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.39 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21245492 | 0.94 | GPR84 (0.48) | CA2MAPK1GPR84FFAR1HDAC2 | |
| SCHEMBL6865861 | 0.92 | CA2 (0.44) | CA2MAPK1PPARGPTGESALOX5 | |
| SCHEMBL11689441 | 0.92 | GPR84 (0.52) | CA2GPR84FFAR1HDAC2MAPT | |
| SCHEMBL31408709 | 0.92 | GPR84 (0.52) | CA2GPR84FFAR1HDAC2MAPT | |
| SCHEMBL10487585 | 0.92 | GPR84 (0.52) | CA2GPR84FFAR1HDAC2MAPT | |
| SCHEMBL445108 | 0.92 | CA2 (0.47) | CA2MAPK1PPARGPTGESALOX5 | |
| SCHEMBL24170746 | 0.88 | GPR84 (0.47) | CA2MAPK1GPR84FFAR1MAPT | |
| SCHEMBL16266035 | 0.88 | GPR84 (0.47) | CA2MAPK1GPR84FFAR1MAPT | |
| SCHEMBL29119089 | 0.88 | GPR84 (0.47) | CA2MAPK1GPR84FFAR1MAPT | |
| SCHEMBL443490 | 0.87 | PPARG (0.46) | CA2MAPK1PPARGGPR84FFAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103857751-A | Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film | DONGWOO FINE CHEM CO LTD | 2014-06-11 | — | — | CN | claimed |
| CN-100429248-C | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2008-10-29 | — | — | CN | claimed |
| CN-1693322-A | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2005-11-09 | — | — | CN | claimed |
| US-10916437-B2 | Methods of forming micropatterns and substrate processing apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-02-09 | — | — | US | disclosed |
| US-20190198342-A1 | Methods of Forming Micropatterns and Substrate Processing Apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-27 | — | — | US | disclosed |
| US-10134606-B2 | Method of forming patterns and method of manufacturing integrated circuit device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-11-20 | — | — | US | disclosed |
| US-9773672-B2 | Method of forming micropatterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-26 | — | — | US | disclosed |
| US-20160233083-A1 | METHOD OF FORMING MICROPATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-08-11 | — | — | US | disclosed |
| CN-103483753-B | Curable resin composition, protective film and liquid crystal display element containing the protective film | CHI MEI CORP. (CN) | 2015-12-09 | — | — | CN | disclosed |
| US-20150340246-A1 | METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-11-26 | — | — | US | disclosed |
| CN-101508846-B | Organic-inorganic composite resin composition useful as protective film | DONGJIN SEMICHEM CO LTD | 2015-05-13 | — | — | CN | disclosed |
| CN-1225509-C | Radiation-sensitive composition capable of having refractive index distribution | JSR CORP (JP) | 2005-11-02 | — | — | CN | disclosed |
| CN-1683461-A | Resin composition and protective film | JSR CORP (JP) | 2005-10-19 | — | — | CN | disclosed |
| CN-1676549-A | Thermosetting composition, solid photographic element anti-dizzy film and forming method thereof and solid photography element | JSR CO LTD (JP) | 2005-10-05 | — | — | CN | disclosed |
| US-20050042536-A1 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO. LTD. (KR) | 2005-02-24 | — | — | US | disclosed |
| CN-1462298-A | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORP (JP) | 2003-12-17 | — | — | CN | disclosed |
| CN-1458209-A | Resin composition and protective film | JSR CORP (JP) | 2003-11-26 | — | — | CN | disclosed |
| CN-1457349-A | Radiation-sensitive composition capable of having refractive index distribution | JSR CORP (JP) | 2003-11-19 | — | — | CN | disclosed |
| CN-1445315-A | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2003-10-01 | — | — | CN | disclosed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | disclosed |