Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | WRN | Q14191 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | ENPP2 | Q13822 | 8/20 | 0.33 |
| ▸ | LPAR6 | P43657 | 3/20 | 0.33 |
| ▸ | LPAR1 | Q92633 | 3/20 | 0.33 |
| ▸ | LPAR4 | Q99677 | 3/20 | 0.33 |
| ▸ | LPAR5 | Q9H1C0 | 3/20 | 0.33 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27869581 | 0.92 | NAAA (0.34) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL223951 | 0.92 | NAAA (0.34) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL28061919 | 0.84 | NAAA (0.34) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL124736 | 0.83 | — | — | |
| SCHEMBL27835213 | 0.82 | MAPT (0.37) | MAPTALDH1A1TSHRENPP2LMNA | |
| SCHEMBL181935 | 0.82 | NAAA (0.39) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL12440384 | 0.82 | SMN1; SMN2 (0.34) | ALDH1A1 | |
| Hydrochloric Acid SCHEMBL27501013 | 0.81 | TSHR (0.46) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL26267516 | 0.81 | NAAA (0.35) | NAAAMAPTALDH1A1CYP1A2HPGD | |
| SCHEMBL23049686 | 0.80 | TSHR (0.33) | MAPTALDH1A1TSHRLMNATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9472813-B2 | Battery electrolyte solution containing certain ester-based solvents, and batteries containing such an electrolyte solution | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-10-18 | — | — | US | claimed |
| EP-2652832-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | Dow Global Technologies LLC (US) | 2013-10-23 | — | — | EP | claimed |
| US-20130260229-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-10-03 | — | — | US | claimed |
| WO-2012082760-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-06-21 | — | — | WO | claimed |
| EP-4411477-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN | FUJIFILM Corporation (JP) | 2024-08-07 | — | — | EP | disclosed |
| US-20240248397-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2024-07-25 | — | — | US | disclosed |
| CN-118020024-A | Actinic-ray-sensitive or radiation-sensitive resin composition, and method for producing resist pattern | 富士胶片株式会社 | 2024-05-10 | — | — | CN | disclosed |
| EP-4342920-A1 | SILICONE CHAIN-CONTAINING POLYMER, COATING COMPOSITION, RESIST COMPOSITION AND ARTICLE | DIC CORPORATION (JP) | 2024-03-27 | — | — | EP | disclosed |
| WO-2023054004-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN | 富士フイルム株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-20220179316-A1 | POLYIMIDE RESIN, POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM AND SEMICONDUCTOR DEVICE | LG CHEM, LTD. (KR) | 2022-06-09 | — | — | US | disclosed |
| US-10414951-B2 | Temporary bonding material, laminate, method for manufacturing laminate, method for manufacturing device substrate, and method for manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10391750-B2 | Cover window plate and image display device including the same | DONGWOO FINE-CHEM CO., LTD. (KR) | 2019-08-27 | — | — | US | disclosed |
| US-8029951-B2 | Colored curable composition, color filter and production method thereof | FUJIFILM CORPORATION (JP) | 2011-10-04 | — | — | US | disclosed |
| US-7592405-B2 | Fluorine-containing photocurable composition | DIC CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080081268-A1 | COLORED CURABLE COMPOSITION, COLOR FILTER AND PRODUCTION METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20070066779-A1 | Fluorine-containing photocurable composition | DIC CORPORATION (JP) | 2007-03-22 | — | — | US | disclosed |
| EP-1698644-A1 | FLUORINE-CONTAINING PHOTOCURING COMPOSITION | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2006-09-06 | — | — | EP | disclosed |
| CN-1818778-A | Photosensitive resin composition, thin film panel and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-08-16 | — | — | CN | disclosed |
| US-20060177767-A1 | Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| US-5321152-A | Esterification of propylene glycol monomethyl ether with propionic acid using acid catalyst | SHINY CHEMICAL INDUSTRIAL CO., LTD. (TW) | 1994-06-14 | — | — | US | disclosed |