SCHEMBL4451896

SCHEMBL4451896

CC(S)C(=O)OCCCCCCCCOC(=O)C(C)S

nearest known ligand 0.47

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.41
RAD52 P43351 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
TSHR P16473 3/20 0.39
ALDH1A1 P00352 2/20 0.39
CYP3A4 P08684 1/20 0.39
EPHX1 P07099 1/20 0.39
ACHE P22303 6/20 0.38
HCAR2 Q8TDS4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4449576 0.97 NAAA (0.38) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL1323048 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL5829903 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL4673244 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL11168355 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL23524456 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL11182554 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL5830901 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL29433045 0.91 NAAA (0.55) NAAARAD52NPSR1TSHRALDH1A1
SCHEMBL3963352 0.89 RARB (0.38) NAAARAD52NPSR1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
WO-2022225039-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER 三菱ケミカル株式会社 2022-10-27 WO disclosed
CN-113444340-A Resin composition 味之素株式会社 2021-09-28 CN disclosed
US-7569327-B2 Curable polymer compound SHOWDA DENKO K.K. (JP) 2009-08-04 US disclosed
EP-1629046-B1 CURABLE POLYMER COMPOUND SHOWA DENKO KK (JP) 2008-05-14 EP disclosed
US-20070083012-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-04-12 US disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
EP-1682589-A1 CURABLE POLYMER COMPOUND Showa Denko K.K. (JP) 2006-07-26 EP disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050258406-A1 Black resist composition for color filter SHOWA DENKO K.K. 2005-11-24 US disclosed
EP-1576418-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION Showa Denko K.K. (JP) 2005-09-21 EP disclosed
EP-1573397-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION Showa Denko K.K. (JP) 2005-09-14 EP disclosed
WO-2005047346-A1 CURABLE POLYMER COMPOUND SHOWA DENKO K.K. (JP) 2005-05-26 WO disclosed
WO-2004055597-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed
WO-2004055596-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed