SCHEMBL4449576

SCHEMBL4449576

CC(S)C(=O)OCCCCOC(=O)C(C)S

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.38
ALDH1A1 P00352 3/20 0.37
RAD52 P43351 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
TSHR P16473 3/20 0.36
CYP3A4 P08684 1/20 0.36
EPHX1 P07099 1/20 0.35
ATM Q13315 1/20 0.34
ACHE P22303 6/20 0.34
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
PTGS2 P35354 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4451896 0.97 NAAA (0.41) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL4679281 0.91 NAAA (0.52) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL4670985 0.91 ACHE (0.42) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL5830909 0.91 ALDH1A1 (0.43) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL1171440 0.89 ALDH1A1 (0.36) ALDH1A1TSHRACHELMNAMAPT
SCHEMBL23524456 0.89 NAAA (0.55) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL5829903 0.89 NAAA (0.55) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL11182554 0.89 NAAA (0.55) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL5830901 0.89 NAAA (0.55) NAAAALDH1A1RAD52NPSR1TSHR
SCHEMBL11168355 0.89 NAAA (0.55) NAAAALDH1A1RAD52NPSR1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12227879-B2 Method and apparatus for preparing monodomain liquid crystal elastomer smart fiber Changzhou University (CN) 2025-02-18 US claimed
US-20240003060-A1 METHOD AND APPARATUS FOR PREPARING MONODOMAIN LIQUID CRYSTAL ELASTOMER SMART FIBER YANGZHOU TECHNOLOGY INNOVATION RESEARCH CENTER FOR CARBON NEUTRALITY OF YANGZHOU UNIVERSITY (CN) 2024-01-04 US claimed
EP-3275911-B1 POLYMERIZABLE COMPOSITION, OPTICAL MEMBER, PLASTIC LENS, AND EYEGLASS LENS HOYA LENS THAILAND LTD (TH) 2025-07-02 EP disclosed
US-12227879-B2 Method and apparatus for preparing monodomain liquid crystal elastomer smart fiber Changzhou University (CN) 2025-02-18 US disclosed
US-20240286111-A1 CARBON DIOXIDE ADSORBENT AND CARBON DIOXIDE ADSORPTION-DESORPTION DEVICE KABUSHIKI KAISHA TOSHIBA (JP) 2024-08-29 US disclosed
EP-4420773-A1 CARBON DIOXIDE ADSORBENT AND CARBON DIOXIDE ADSORPTION-DESORPTION DEVICE Kabushiki Kaisha Toshiba (JP) 2024-08-28 EP disclosed
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
US-20240003060-A1 METHOD AND APPARATUS FOR PREPARING MONODOMAIN LIQUID CRYSTAL ELASTOMER SMART FIBER YANGZHOU TECHNOLOGY INNOVATION RESEARCH CENTER FOR CARBON NEUTRALITY OF YANGZHOU UNIVERSITY (CN) 2024-01-04 US disclosed
WO-2023133947-A1 PREPARATION METHOD AND APPARATUS FOR SINGLE-DOMAIN LIQUID CRYSTAL ELASTOMER INTELLIGENT FIBERS 常州大学 2023-07-20 WO disclosed
WO-2022225039-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER 三菱ケミカル株式会社 2022-10-27 WO disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050258406-A1 Black resist composition for color filter SHOWA DENKO K.K. 2005-11-24 US disclosed
EP-1576418-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION Showa Denko K.K. (JP) 2005-09-21 EP disclosed
EP-1573397-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION Showa Denko K.K. (JP) 2005-09-14 EP disclosed
WO-2005047346-A1 CURABLE POLYMER COMPOUND SHOWA DENKO K.K. (JP) 2005-05-26 WO disclosed
WO-2004106431-A2 CURABLE POLYMER COMPOUND SHOWA DENKO K.K. (JP) 2004-12-09 WO disclosed
WO-2004055597-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed
WO-2004055596-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed