Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 6/20 | 0.60 |
| ▸ | MEN1 | O00255 | 8/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.59 |
| ▸ | MAPT | P10636 | 7/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.59 |
| ▸ | HPGD | P15428 | 5/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.59 |
| ▸ | ATM | Q13315 | 3/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.59 |
| ▸ | SLC16A3 | O15427 | 2/20 | 0.59 |
| ▸ | USP2 | O75604 | 2/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.59 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.59 |
| ▸ | SLC16A1 | P53985 | 1/20 | 0.59 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.50 |
| ▸ | BRCA1 | P38398 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 3/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29811188 | 1.00 | MAOB (0.60) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL9643088 | 0.93 | CYP2C19 (0.58) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL8595764 | 0.88 | ALDH1A1 (0.68) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL6836388 | 0.86 | ALDH1A1 (0.65) | MAOBMEN1KMT2AALDH1A1KDM4E | |
| SCHEMBL51872 | 0.84 | MEN1 (0.82) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL195769 | 0.83 | MAOB (0.71) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL6836549 | 0.83 | MAOB (0.64) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL5940595 | 0.83 | MEN1 (0.56) | MAOBMEN1KMT2AALDH1A1KDM4E | |
| SCHEMBL2028924 | 0.82 | MAOB (0.76) | MAOBMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL13869329 | 0.82 | CYP19A1 (0.59) | MAOBMEN1KMT2AALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11198757-B2 | Compositions including a photolatent amine, camphorquinone, and coumarin and related methods | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-12-14 | — | — | US | claimed |
| US-20190256646-A1 | COMPOSITIONS INCLUDING A PHOTOLATENT AMINE, CAMPHORQUINONE, AND COUMARIN AND RELATED METHODS | 3M INNOVATIVE PROPERTIES COMPANY | 2019-08-22 | — | — | US | claimed |
| US-5055372-A | Photohardenable composition containing borate salts and ketone initiators | THE MEAD CORPORATION (US) | 1991-10-08 | — | — | US | claimed |
| US-4147552-A | Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers | EASTMAN KODAK COMPANY (US) | 1979-04-03 | — | — | US | claimed |
| WO-2023238202-A1 | PHOTOSENSITIVE ELEMENT AND FORMATION METHOD FOR RESIST PATTERN | 株式会社レゾナック | 2023-12-14 | — | — | WO | disclosed |
| WO-2023238814-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 株式会社レゾナック | 2023-12-14 | — | — | WO | disclosed |
| US-20230324789-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORMING PERMANENT RESIST, AND METHOD FOR INSPECTING PERMANENT RESIST CURED FILM | RESONAC CORPORATION (JP) | 2023-10-12 | — | — | US | disclosed |
| WO-2023281584-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORMING PERMANENT RESIST, AND METHOD FOR INSPECTING PERMANENT RESIST CURED FILM | 昭和電工マテリアルズ株式会社 | 2023-01-12 | — | — | WO | disclosed |
| US-11198757-B2 | Compositions including a photolatent amine, camphorquinone, and coumarin and related methods | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-12-14 | — | — | US | disclosed |
| US-20210371667-A1 | COMPOSITION INCLUDING AMINO-FUNCTIONAL SILANES AND METHOD OF APPLYING A SEALANT TO A SUBSTRATE | 3M INNOVATIVE PROPERTIES COMPANY | 2021-12-02 | — | — | US | disclosed |
| US-11090681-B2 | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-08-17 | — | — | US | disclosed |
| US-20190276588-A1 | COMPOSITION INCLUDING A POLYTHIOL, A POLYEPOXIDE, A PHOTOLATENT BASE, AND AN AMINE AND METHODS RELATING TO THE COMPOSITION | 3M INNOVATIVE PROPERTIES COMPANY | 2019-09-12 | — | — | US | disclosed |
| EP-0537975-A1 | Positive-acting photothermographic materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-04-21 | — | — | EP | disclosed |
| EP-0537912-A1 | Positive-acting photothermographic materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-04-21 | — | — | EP | disclosed |
| US-5055372-A | Photohardenable composition containing borate salts and ketone initiators | THE MEAD CORPORATION (US) | 1991-10-08 | — | — | US | disclosed |
| US-4950581-A | HIGH PHOTOSENSITIVITY; USING PHOTOINITIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1990-08-21 | — | — | US | disclosed |
| EP-0319296-A2 | Photopolymerisable composition | Horsell Plc (GB) | 1989-06-07 | — | — | EP | disclosed |
| US-4713312-A | Imaging system employing photosensitive microcapsules containing 3-substituted coumarins and other photobleachable sensitizers | THE MEAD CORPORATION (US) | 1987-12-15 | — | — | US | disclosed |
| US-4152159-A | ACRYLIC ESTER POLYMERS | EASTMAN KODAK COMPANY (US) | 1979-05-01 | — | — | US | disclosed |
| US-4147552-A | Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers | EASTMAN KODAK COMPANY (US) | 1979-04-03 | — | — | US | disclosed |