⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5933680 | 0.86 | — | — | |
| SCHEMBL291849 | 0.78 | ALDH1A1 (0.47) | — | |
| SCHEMBL110228 | 0.75 | — | — | |
| SCHEMBL20795 | 0.75 | — | — | |
| SCHEMBL28395913 | 0.75 | TSHR (0.53) | — | |
| SCHEMBL5256895 | 0.75 | MGAM (0.55) | — | |
| SCHEMBL11691986 | 0.73 | — | — | |
| SCHEMBL4676344 | 0.73 | — | — | |
| SCHEMBL5932274 | 0.73 | — | — | |
| SCHEMBL12172802 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6737215-B2 | Photoresist composition for deep ultraviolet lithography | CLARIANT FINANCE (BVI) LTD (VG) | 2004-05-18 | — | — | US | claimed |
| EP-1392745-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | Clariant Finance (BVI) Limited (VG) | 2004-03-03 | — | — | EP | claimed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | claimed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| CN-112239407-B | Diester compound having dimethylcyclobutane ring, method for producing the same, and method for producing dimethylcyclobutane compound derived from the same | 信越化学工业株式会社 | 2024-05-28 | — | — | CN | disclosed |
| EP-3766862-B1 | DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME | SHINETSU CHEMICAL CO (JP) | 2023-06-07 | — | — | EP | disclosed |
| EP-3766861-B1 | DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-24 | — | — | EP | disclosed |
| US-20220324783-A1 | DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-13 | — | — | US | disclosed |
| US-11384043-B2 | Dimethylcyclobutanone compounds, dimethylcyclobutane compounds, and processes for preparing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| US-11352312-B2 | Diester compound having a dimethylcyclobutane ring, a process for preparing the same, and a process for preparing dimethylcyclobutane compound derived from the diester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | disclosed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | disclosed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| US-4914206-A | ANTIBIOTICS | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1990-04-03 | — | — | US | disclosed |
| EP-0226896-A2 | Lankacidin derivatives and production thereof | Takeda Chemical Industries, Ltd. (JP) | 1987-07-01 | — | — | EP | disclosed |