Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Quinoline SCHEMBL3181877 | 0.83 | ALDH1A1 (0.52) | CYP2A6ALDH1A1CYP1A2KMT2ALMNA | |
| SCHEMBL12013593 | 0.83 | CYP2A6 (0.56) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL30066585 | 0.82 | CYP2A6 (0.50) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL6267184 | 0.82 | CYP2A6 (0.50) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL6910872 | 0.81 | CYP2A6 (0.54) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL4697244 | 0.81 | CYP2A6 (0.54) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL8578429 | 0.81 | CYP2A6 (0.54) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL8895165 | 0.81 | CYP2A6 (0.54) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL6404480 | 0.81 | CYP2A6 (0.54) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 | |
| SCHEMBL2466465 | 0.78 | L3MBTL1 (0.59) | CYP2A6ALDH1A1HSD17B10TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-H751-H | METHOD OF INHIBITING ACID CORROSION OF FERROUS METALS | SULLIVAN DANIEL S (US) | 1990-03-06 | — | — | US | claimed |
| US-7532795-B2 | Radiation-curable liquid resin composition | DSM IP ASSETS B.V. (NL) | 2009-05-12 | — | — | US | disclosed |
| US-20070191505-A1 | Radiation-curable liquid resin composition | DSM IP ASSETS B.V. (NL) | 2007-08-16 | — | — | US | disclosed |
| CN-1852955-A | Radiation-curable liquid resin composition | DSM IP ASSETS BV (NL) | 2006-10-25 | — | — | CN | disclosed |
| EP-1656430-A2 | RADIATION-CURABLE LIQUID RESIN COMPOSITION | DSM IP Assets B.V. (NL) | 2006-05-17 | — | — | EP | disclosed |
| EP-0975693-B2 | LIQUID CURABLE RESIN COMPOSITION | KONINK DSM N V (NL) | 2006-01-18 | — | — | EP | disclosed |
| WO-2005019128-A2 | RADIATION-CURABLE LIQUID RESIN COMPOSITION | DSM IP ASSETS B.V. (NL) | 2005-03-03 | — | — | WO | disclosed |
| CN-1175036-C | Liquid curable resin composition | DSM有限公司 | 2004-11-10 | — | — | CN | disclosed |
| EP-0975693-B1 | LIQUID CURABLE RESIN COMPOSITION | DSM NV (NL) | 2002-12-18 | — | — | EP | disclosed |
| US-6359025-B1 | MINIMUM YELLOWING, DURABILITY | DSM N.V. (NL) | 2002-03-19 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4048415-A | TITANIUM-ALUMINUM COORDINATION CATALYSTS | MITSUI PETROCHEMICAL INDUSTRIES LTD. (JA) | 1977-09-13 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-4028204-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a resin and a polycarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |
| US-4022674-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a monomeric ester and a polycarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-05-10 | — | — | US | disclosed |
| US-4008138-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a monocarboxy-substituted benzophenone with a resin | SUN CHEMICAL CORPORATION (US) | 1977-02-15 | — | — | US | disclosed |
| US-4004998-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a hydroxy-containing ester and a monocarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-01-25 | — | — | US | disclosed |
| US-3966573-A | HALOGENATED HYDROCARBONS, CARBONYL COMPOUNDS, ORGANO-NITROGEN, PHOSPHOROUS, ARSENIC, BISMUTH, OR ANTIMONY COMPOUNDS | SUN CHEMICAL CORPORATION (US) | 1976-06-29 | — | — | US | disclosed |
| US-3933682-A | Photopolymerization co-initiator systems | SUN CHEMICAL CORPORATION (US) | 1976-01-20 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |