⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL33525104 | 0.71 | ALDH1A1 (0.35) | — | |
| SCHEMBL33525138 | 0.68 | ALDH1A1 (0.37) | — | |
| SCHEMBL9184653 | 0.67 | — | — | |
| SCHEMBL20942803 | 0.67 | HSD17B10 (0.32) | — | |
| SCHEMBL20942791 | 0.65 | HSD17B10 (0.31) | — | |
| SCHEMBL28225125 | 0.62 | ALDH1A1 (0.32) | — | |
| SCHEMBL4456584 | 0.57 | ALDH1A1 (0.37) | — | |
| SCHEMBL13714789 | 0.56 | ALDH1A1 (0.35) | — | |
| SCHEMBL13714810 | 0.56 | ALDH1A1 (0.35) | — | |
| SCHEMBL9181709 | 0.54 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9061317-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-8951342-B2 | Methods for using porogens for low k porous organosilica glass films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-02-10 | — | — | US | disclosed |
| US-20130095255-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-04-18 | — | — | US | disclosed |
| US-20120282415-A1 | Methods For Using Porogens For Low K Porous Organosilica Glass Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-11-08 | — | — | US | disclosed |
| EP-2116632-A2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Air Products and Chemicals, Inc. (US) | 2009-11-11 | — | — | EP | disclosed |
| US-20080268177-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |