SCHEMBL4456584

SCHEMBL4456584

CC(=O)O[Si]1(OC(C)=O)C[Si](OC(C)=O)(OC(C)=O)C1

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
TSHR P16473 2/20 0.37
HSD17B10 Q99714 2/20 0.30
LMNA P02545 2/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8854366 0.77 ALDH1A1 (0.33) ALDH1A1TSHRHSD17B10TDP1
SCHEMBL9181709 0.77 ALDH1A1 (0.33) ALDH1A1TSHRHSD17B10TDP1
SCHEMBL22632354 0.75 HSD17B10 (0.32) ALDH1A1TSHRHSD17B10TDP1
SCHEMBL33525104 0.73 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL20769858 0.71 ALDH1A1 (0.35) ALDH1A1
SCHEMBL20769862 0.71 ALDH1A1 (0.35) ALDH1A1
SCHEMBL20769888 0.69 ALDH1A1 (0.33) ALDH1A1
SCHEMBL20769869 0.68 ALDH1A1 (0.37) ALDH1A1TSHRHSD17B10LMNA
SCHEMBL20769887 0.68 ALDH1A1 (0.37) ALDH1A1TSHRHSD17B10LMNA
Cyclopentane SCHEMBL29146082 0.56 ALDH1A1 (0.77) ALDH1A1TSHRHSD17B10LMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9061317-B2 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-06-23 US disclosed
US-8951342-B2 Methods for using porogens for low k porous organosilica glass films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-10 US disclosed
US-20130095255-A1 Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-04-18 US disclosed
US-20120282415-A1 Methods For Using Porogens For Low K Porous Organosilica Glass Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-11-08 US disclosed
EP-2116632-A2 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Air Products and Chemicals, Inc. (US) 2009-11-11 EP disclosed
US-20080268177-A1 Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-10-30 US disclosed