SCHEMBL4454652

SCHEMBL4454652

Oc1ccsc1O.c1cnnnc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3568012 0.81
SCHEMBL2994954 0.81
Catechol SCHEMBL27546198 0.71 ALDH1A1 (0.59)
SCHEMBL11217665 0.64 CASP6 (0.33)
Phenol SCHEMBL27969880 0.64 CA12 (0.61)
Phenol SCHEMBL723357 0.64 CA12 (0.61)
Phenol SCHEMBL5509919 0.64 CA12 (0.61)
Hydrogen Peroxide SCHEMBL27500303 0.63
Phloroglucinol SCHEMBL29110699 0.63 BACE1 (0.50)
SCHEMBL13282 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592119-B2 Photosensitive polyimide resin composition SONY CORPORATION (JP) 2009-09-22 US disclosed
US-20090075198-A1 Improves developability of photosensitive polyimide resin composition with weakly alkaline aqueous solution without reduction in solubility in general-purpose organic solvents even when part of diamine component is replaced with a diaminopolysiloxane-based compound or a bis(aminobenzoate)-based compound SONY CHEMICAL & INFORMATION DEVICE CORPORATION (JP) 2009-03-19 US disclosed