Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
| ▸ | SI | P14410 | 1/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.37 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.37 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3675031 | 0.84 | ALDH1A1 (0.41) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL10405114 | 0.84 | HSD17B10 (0.38) | ALDH1A1HSD17B10LMNACHRM1TSHR | |
| Toluene SCHEMBL29074731 | 0.84 | PIN1 (0.46) | ALDH1A1LMNATSHRTDP1KDM4E | |
| SCHEMBL31238993 | 0.82 | CYP2C9 (0.32) | CYP3A4CYP2C19GAA | |
| SCHEMBL23502698 | 0.82 | ALDH1A1 (0.39) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL28643623 | 0.82 | ALDH1A1 (0.39) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL28106235 | 0.82 | ALDH1A1 (0.44) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL445591 | 0.81 | ALDH1A1 (0.42) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL12150115 | 0.81 | ALDH1A1 (0.55) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 | |
| SCHEMBL10405304 | 0.80 | HSD17B10 (0.50) | ALDH1A1HSD17B10LMNACYP3A4CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 213 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111061125-A | Photoresist and application thereof | 常州强力先端电子材料有限公司 | 2020-04-24 | — | — | CN | claimed |
| CN-102768467-B | Sensitizer for chemical amplification type positive photoresist and application thereof | CHINESE ACAD TECH INST PHYSICS | 2014-11-05 | — | — | CN | claimed |
| CN-102768466-A | Chemical amplification type positive photoresist, preparation method and application thereof in two-photon fine processing | CHINESE ACAD TECH INST PHYSICS | 2012-11-07 | — | — | CN | claimed |
| CN-102768467-A | Sensitizer for chemical amplification type positive photoresist and application thereof in preparation of chemical amplification type positive photoresist | CHINESE ACAD TECH INST PHYSICS | 2012-11-07 | — | — | CN | claimed |
| EP-1637928-B1 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2012-05-02 | — | — | EP | claimed |
| EP-1736828-B1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2010-11-24 | — | — | EP | claimed |
| CN-1885161-B | Photoresist monomer, polymer thereof and photoresist composition containing photoresist polymer | DONGJIN SEMICHEM CO LTD | 2010-10-13 | — | — | CN | claimed |
| US-7504195-B2 | Photosensitive polymer and photoresist composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-17 | — | — | US | claimed |
| US-7501222-B2 | Photoresist monomer polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-10 | — | — | US | claimed |
| US-7419761-B2 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-09-02 | — | — | US | claimed |
| EP-1637928-A2 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD (KR) | 2006-03-22 | — | — | EP | claimed |
| US-20060057494-A1 | Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same | DONGJIN SEMICHEM CO., LTD. | 2006-03-16 | — | — | US | claimed |
| WO-2005109102-A1 | PHOTOACTIVE MONOMER, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-11-17 | — | — | WO | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-0629671-B1 | Solvent composition | MITSUBISHI RAYON CO (JP) | 2002-03-27 | — | — | EP | claimed |
| EP-1016698-A1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| US-5630945-A | RECOVERING STYRENE, POLYESTER AND ACRYLIC RESIN FROM WASTE AS A SOLUTION AND RECOVERING SOLVENT WITH OXYISOBUTYRIC ACID ESTER | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-05-20 | — | — | US | claimed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | claimed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | claimed |