SCHEMBL4457413

SCHEMBL4457413

CCCc1n[nH]c(N)n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9830433 0.87 SMN1; SMN2 (0.47)
SCHEMBL1957909 0.84 ALDH1A1 (0.53)
SCHEMBL8660213 0.81 CASP1 (0.39)
SCHEMBL4471709 0.81
SCHEMBL8656235 0.81 CASP1 (0.44)
SCHEMBL8658631 0.79 ALDH1A1 (0.39)
SCHEMBL26111776 0.79 ALDH1A1 (0.39)
SCHEMBL26109106 0.79 ALDH1A1 (0.39)
Hydrochloric Acid SCHEMBL27781216 0.79 ALDH1A1 (0.39)
SCHEMBL26109650 0.79 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118655750-A Stripping liquid for semiconductor compound photoresist, preparation method and application thereof 浙江奥首材料科技有限公司 2024-09-17 CN claimed
US-20260001886-A1 ENPP1 INHIBITORS I RE VENTURES I LLC (US) 2026-01-01 US disclosed
WO-2025233863-A1 ENPP1 INHIBITORS RE VENTURES I, LLC (US) 2025-11-13 WO disclosed
CN-118655750-A Stripping liquid for semiconductor compound photoresist, preparation method and application thereof 浙江奥首材料科技有限公司 2024-09-17 CN disclosed
EP-2077266-A1 2-PYRIDINECARBOXAMIDE DERIVATIVE HAVING GK-ACTIVATING ACTIVITY BANYU PHARMACEUTICAL CO., LTD. (JP) 2009-07-08 EP disclosed
US-4282008-A METHANOL AND/OR ETHANOL; REACTION PRODUCT OF ISATOIC ANHYDRIDE, AMINOTRIAZOLE, POLY-PRIMARY AMINE; CORROSION RESISTANCE TEXACO INC. (US) 1981-08-04 US disclosed