SCHEMBL4458956

SCHEMBL4458956

CCCC(C)(S)S(=O)(=O)O

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.31
FDPS P14324 2/20 0.31
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6767218 0.84
SCHEMBL6769713 0.76 CYP4F2 (0.33)
SCHEMBL8936636 0.76
SCHEMBL6771168 0.74
SCHEMBL6018675 0.74 FDPS (0.33) FDPSALDH1A1LMNAHSD17B10
SCHEMBL6768046 0.73 FDPS (0.30) FDPS
SCHEMBL6906998 0.70 FDPS (0.36) FDPSALDH1A1LMNAHSD17B10
SCHEMBL13890873 0.70 FDPS (0.31) FDPSALDH1A1LMNAHSD17B10
SCHEMBL11118339 0.70 FDPS (0.39) TP53FDPSALDH1A1LMNAHSD17B10
SCHEMBL26319258 0.70 FDPS (0.31) FDPSALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1524289-B1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2009-09-16 EP disclosed
US-20070149639-A1 Polymerizable composition, optical material comprising the composition and method for producing the material HORIKOSHI HIROSHI 2007-06-28 US disclosed
EP-1524289-A1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-04-20 EP disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed