SCHEMBL4459373

SCHEMBL4459373

CC(CS)C(=O)O.CC(CS)C(=O)O.OCCCCCCCCO

nearest known ligand 0.47

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ENPEP Q07075 2/20 0.47
GPR84 Q9NQS5 1/20 0.41
FFAR1 O14842 1/20 0.41
FFAR4 Q5NUL3 1/20 0.41
ACE2 Q9BYF1 1/20 0.39
GABRR1 P24046 2/20 0.38
CYP1A2 P05177 1/20 0.38
BLM P54132 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,4-Butanediol SCHEMBL4458925 0.98 ENPEP (0.48) ENPEPGPR84FFAR1FFAR4GABRR1
Ethylene Glycol SCHEMBL1171186 0.88 ENPEP (0.52) ENPEPGABRR1CYP1A2
Ethylene Glycol SCHEMBL27658842 0.88 ENPEP (0.52) ENPEPGABRR1CYP1A2
SCHEMBL8433171 0.85
SCHEMBL3742130 0.85
SCHEMBL161586 0.85
Hydrochloric Acid SCHEMBL7710922 0.83
SCHEMBL8984664 0.79 ACE2 (0.55) GPR84FFAR1FFAR4ACE2GABRR1
SCHEMBL5074983 0.79 ACE2 (0.55) GPR84FFAR1FFAR4ACE2GABRR1
SCHEMBL8230933 0.79 ACE2 (0.55) GPR84FFAR1FFAR4ACE2GABRR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
US-7569327-B2 Curable polymer compound SHOWDA DENKO K.K. (JP) 2009-08-04 US disclosed
EP-1629046-B1 CURABLE POLYMER COMPOUND SHOWA DENKO KK (JP) 2008-05-14 EP disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed