SCHEMBL446182

SCHEMBL446182

CCCOOC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31438278 0.85 ALDH1A1 (0.41)
SCHEMBL22609539 0.85 ALDH1A1 (0.41)
SCHEMBL8673647 0.85 ALDH1A1 (0.39)
SCHEMBL22228 0.84
SCHEMBL11511938 0.83 ALDH1A1 (0.42)
SCHEMBL124892 0.82 ALDH1A1 (0.50)
SCHEMBL29009577 0.82 ALDH1A1 (0.56)
Calcium SCHEMBL30605675 0.82 ALDH1A1 (0.56)
SCHEMBL4757130 0.81 SOAT1 (0.42)
SCHEMBL11454255 0.80 CES2 (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4591370-A Cryogenic process for removing acid gases from gas mixtures by means of a solvent SNAMPROGETTI, S.P.A. (IT) 1986-05-27 US claimed
US-4561869-A Cryogenic process for the selective removal of acid gases from gas mixtures by means of a solvent SNAMPROGETTI, S.P.A. (IT) 1985-12-31 US claimed
CN-116396228-B Uracil PARP7 inhibitors 上海湃隆生物科技有限公司 2024-08-02 CN disclosed
CN-116396228-A Uracil PARP7 inhibitors 上海湃隆生物科技有限公司 2023-07-07 CN disclosed
US-11402755-B2 Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article TOKYO OHKA KOGYO CO., LTD. (JP) 2022-08-02 US disclosed
US-20220026801-A1 CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD (JP) 2022-01-27 US disclosed
US-10916437-B2 Methods of forming micropatterns and substrate processing apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-02-09 US disclosed
US-20190198342-A1 Methods of Forming Micropatterns and Substrate Processing Apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-27 US disclosed
US-10134606-B2 Method of forming patterns and method of manufacturing integrated circuit device using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-11-20 US disclosed
US-9773672-B2 Method of forming micropatterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-09-26 US disclosed
US-20160233083-A1 METHOD OF FORMING MICROPATTERNS SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-08-11 US disclosed
US-20050043452-A1 Colorant-containing curable composition, color filter and method of producing the same FUJI PHOTO FILM CO., LTD. 2005-02-24 US disclosed
US-20040009414-A1 Dye-containing curable composition, color filter and method of manufacturing the same FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
US-6140016-A LIGHT SENSITIVE ELEMENTS AND COLOR FILTERS FUJI PHOTO FILM CO. LTD. (JP) 2000-10-31 US disclosed
EP-0399856-B1 Pteridin-4 (3H)-ones, processes for their preparation and medicaments containing them LIPHA (FR) 1995-08-09 EP disclosed
EP-0399856-A1 Pteridin-4 (3H)-ones, processes for their preparation and medicaments containing them LIPHA, LYONNAISE INDUSTRIELLE PHARMACEUTIQUE (FR) 1990-11-28 EP disclosed
CN-87107938-A 3-pyrrolidyl sulfo--1-azabicyclo [3,2,0] hept-2-ene\"-2-formic acid cpds and preparation method thereof 1988-08-10 CN disclosed
US-4591370-A Cryogenic process for removing acid gases from gas mixtures by means of a solvent SNAMPROGETTI, S.P.A. (IT) 1986-05-27 US disclosed
US-4561869-A Cryogenic process for the selective removal of acid gases from gas mixtures by means of a solvent SNAMPROGETTI, S.P.A. (IT) 1985-12-31 US disclosed
US-4179536-A ANITFUNGAL TRIBUTYLTIN COMPOUNDS KASAMATSU HIROSHI 1979-12-18 US disclosed